Electronic Structure and Optical Quality of Nanocrystalline Y2O3 Film Surfaces and Interfaces on Silicon Full article
Journal |
The Journal of Physical Chemistry C
ISSN: 1932-7447 , E-ISSN: 1932-7455 |
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Output data | Year: 2014, Volume: 118, Number: 25, Pages: 13644-13651 Pages count : 8 DOI: 10.1021/jp502876r | ||||||||||||
Tags | Binding energy; Chemical bonds; Deposition; Depth profiling; Electronic structure; Nanocrystalline silicon; Nanocrystals; Oxide films; Refractive index; Silicon compounds; Spectroscopic ellipsometry; Substrates; Thin films; X ray photoelectron spectroscopy; Yttrium oxide | ||||||||||||
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Affiliations |
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Funding (2)
1 | The Ministry of Education and Science of the Russian Federation | |
2 | National Science Foundation | DMR-1205302 |
Abstract:
Nanocrystalline yttrium oxide (Y2O3) thin films were made by sputter deposition onto silicon (100) substrates keeping the deposition temperature fixed at 300 °C. The surface/interface chemistry, Y–O bonding, and optical constants of the Y2O3 film surface and Y2O3–Si interface were evaluated by the combined use of X-ray photoelectron spectroscopy (XPS), depth-profiling, and spectroscopic ellipsometry (SE). XPS analyses indicate the binding energies (BEs) of the Y 3d doublet; i.e., the Y 3p5/2 and Y 3d3/2 peaks are located at 117.0 and 119.1 eV, respectively, characterizing yttrium in its highest chemical oxidation state (Y3+) in the grown films. The optical model is constructed based on the XPS depth profiles, which indicate that the Y2O3//Si heterostructure can be represented with Y2O3 film—YxSiyOz interfacial compound—Si substrate. Such a model accounts for the experimentally determined ellipsometry functions and accurately produces the dispersive index of refraction (n(λ)) of Y2O3 and YxSiyOz. The n(λ) of Y2O3 and YxSiyOz follows Cauchy’s dispersion relation, while the YxSiyOz formation accounts for degradation of optical quality.
Cite:
Rubio E.J.
, Atuchin V.V.
, Kruchinin V.N.
, Pokrovskii L.D.
, Prosvirin I.P.
, Ramana C.V.
Electronic Structure and Optical Quality of Nanocrystalline Y2O3 Film Surfaces and Interfaces on Silicon
The Journal of Physical Chemistry C. 2014. V.118. N25. P.13644-13651. DOI: 10.1021/jp502876r WOS Scopus РИНЦ
Electronic Structure and Optical Quality of Nanocrystalline Y2O3 Film Surfaces and Interfaces on Silicon
The Journal of Physical Chemistry C. 2014. V.118. N25. P.13644-13651. DOI: 10.1021/jp502876r WOS Scopus РИНЦ
Dates:
Submitted: | Mar 23, 2014 |
Accepted: | May 15, 2014 |
Published online: | Jun 11, 2014 |
Published print: | Jun 26, 2014 |
Identifiers:
Web of science | WOS:000338184300036 |
Scopus | 2-s2.0-84911464554 |
Elibrary | 24006376 |
Chemical Abstracts | 2014:901907 |
Chemical Abstracts (print) | 161:104868 |
OpenAlex | W2317085288 |