Superhard Nanocrystalline Ti–Cu–N Coatings Deposited by Vacuum arc Evaporation of a Sintered Cathode Full article
Journal |
Surface and Coatings Technology
ISSN: 0257-8972 , E-ISSN: 1879-3347 |
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Output data | Year: 2012, Volume: 207, Pages: 430-434 Pages count : 5 DOI: 10.1016/j.surfcoat.2012.07.037 | ||||||||
Tags | Nanocrystalline structure, Ti-Cu-N coating, Transmission electron microscopy, Vacuum-arc deposition, X-ray diffraction | ||||||||
Authors |
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Abstract:
Experimental data are presented on the structure and properties of hardening nanocrystalline copper-added titanium nitride coatings produced by plasma-assisted vacuum arc evaporation of sintered cathodes. A model of the nanostructurization of this type of coating is proposed. According to the model, the nanocrystallization in these materials is due to the added atoms, which form an amorphous sheath around a grain that restricts the grain growth.
Cite:
Ivanov Y.F.
, Koval N.N.
, Krysina O.V.
, Baumbach T.
, Doyle S.
, Slobodsky T.
, Timchenko N.A.
, Galimov R.M.
, Shmakov A.N.
Superhard Nanocrystalline Ti–Cu–N Coatings Deposited by Vacuum arc Evaporation of a Sintered Cathode
Surface and Coatings Technology. 2012. V.207. P.430-434. DOI: 10.1016/j.surfcoat.2012.07.037 WOS Scopus РИНЦ
Superhard Nanocrystalline Ti–Cu–N Coatings Deposited by Vacuum arc Evaporation of a Sintered Cathode
Surface and Coatings Technology. 2012. V.207. P.430-434. DOI: 10.1016/j.surfcoat.2012.07.037 WOS Scopus РИНЦ
Dates:
Submitted: | Dec 19, 2011 |
Accepted: | Jul 10, 2012 |
Published online: | Jul 20, 2012 |
Published print: | Aug 1, 2012 |
Identifiers:
Web of science | WOS:000309501600060 |
Scopus | 2-s2.0-84865733298 |
Elibrary | 20473520 |
Chemical Abstracts | 2012:1130016 |
Chemical Abstracts (print) | 158:222356 |
OpenAlex | W2171586333 |