Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane Full article
Journal |
Inorganic Materials
ISSN: 0020-1685 , E-ISSN: 1608-3172 |
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Output data | Year: 2003, Volume: 39, Number: 4, Pages: 366-373 Pages count : 8 DOI: 10.1023/A:1023227716045 | ||||||
Tags | Ammonia; Boron; Helium; Nitride; Physicochemical Property | ||||||
Authors |
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Affiliations |
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Funding (3)
1 | Russian Foundation for Basic Research | 00-03-32507 |
2 | Президиум РАН | 181 |
3 | Russian Foundation for Basic Research | 00-15-97448 |
Abstract:
Boron carbonitride and boron nitride films were grown by plasma-enhanced chemical vapor deposition using trimethylamineborane and its mixtures with ammonia, hydrogen, or helium. The effects of the starting-mixture composition and substrate temperature on the chemical composition of the deposits was studied by ellipsometry, scanning microscopy, IR spectroscopy, Raman scattering, and x-ray photoelectron spectroscopy. The results indicate that the initial composition of the gas mixture, the nature of the activation gas, and substrate temperature play a key role in determining the deposition kinetics and the physicochemical properties of the deposits. Depending on these process parameters, one can obtain h-BN, h-BN + B4C, or BCxNy films.
Cite:
Kosinova M.L.
, Rumyantsev Y.M.
, Golubenko A.N.
, Fainer N.I.
, Ayupov B.M.
, Dolgovesova I.P.
, Kolesov B.A.
, Kaichev V.V.
, Kuznetsov F.A.
Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane
Inorganic Materials. 2003. V.39. N4. P.366-373. DOI: 10.1023/A:1023227716045 WOS Scopus РИНЦ
Chemical Composition of Boron Carbonitride Films Grown by Plasma-Enhanced Chemical Vapor Deposition from Trimethylamineborane
Inorganic Materials. 2003. V.39. N4. P.366-373. DOI: 10.1023/A:1023227716045 WOS Scopus РИНЦ
ArticleLinkType.TRANSLATED_TO_ORIGINAL:
Косинова М.Л.
, Румянцев Ю.М.
, Голубенко А.Н.
, Файнер Н.И.
, Аюпов Б.М.
, Долговесова И.П.
, Колесов Б.А.
, Каичев В.В.
, Кузнецов Ф.А.
Химический состав пленок BCxNy, полученных плазмохимическим разложением триметиламинборана
Неорганические материалы. 2003. Т.39. №4. С.447-455. РИНЦ
Химический состав пленок BCxNy, полученных плазмохимическим разложением триметиламинборана
Неорганические материалы. 2003. Т.39. №4. С.447-455. РИНЦ
Dates:
Submitted: | May 24, 2002 |
Published print: | Apr 1, 2003 |
Identifiers:
Web of science | WOS:000182485900014 |
Scopus | 2-s2.0-3442896479 |
Elibrary | 13429762 |
Chemical Abstracts | 2003:275946 |
Chemical Abstracts (print) | 139:72563 |
OpenAlex | W130470174 |