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H/D-Isotope Effects in Chemical Wave Propagation on Surfaces: The O-2+H-2 and NO+H-2 Reactions on Rh(110) and Rh(111) Full article

Общее Language: Английский, Genre: Full article,
Status: Published, Source type: Original
Journal Surface Science
ISSN: 0039-6028
Output data Year: 1999, Volume: 421, Number: 1-2, Pages: 191-203 Pages count : 13 DOI: 10.1016/S0039-6028(98)00855-3
Tags Catalysis, Hydrogen, Nitrogen oxides, Oxygen, Pattern formation, Photoemission electron microscopy (PEEM), Rhodium, Single crystal surfaces, Surface chemical reaction, Surface diffusion
Authors Schaak A. 1 , Shaikhutdinov S. 1,2 , Imbihl R. 1
Affiliations
1 Institut für Physikalische Chemie und Elektrochemie, Universität Hannover, Callinstrasse 3–3a, 30167 Hannover, Germany
2 Boreskov Institute of Catalysis, Pr. Lavrentieva 5, Novosibursk 630090, Russia.

Abstract: H/D-isotope effects in chemical wave propagation in the bistable O2+H2 reaction on Rh(110) and Rh(111) and in the excitable NO+H2 reaction on Rh(110) were investigated using photoemission electron microscopy (PEEM) as spatially resolving method. The systems were studied in the 10−6–10−4 mbar range between 400 K and 700 K. For equivalent partial pressures, i.e., partial pressures which have been corrected for the different impingement rates of H2 and D2, front and pulse propagation with H2 is typically faster than with D2 up to a factor of three. A similar difference exists with respect to the width of the existence range for pattern formation in pH2(D2), which is broader with D2 than with H2. Titration experiments of the oxygen-covered Rh(110) surface demonstrated that at high oxygen coverages, the reactive sticking of D2 is inhibited much more strongly than with H2. From the T-dependence of the front velocities, apparent activation energies were determined for the two isotopes.
Cite: Schaak A. , Shaikhutdinov S. , Imbihl R.
H/D-Isotope Effects in Chemical Wave Propagation on Surfaces: The O-2+H-2 and NO+H-2 Reactions on Rh(110) and Rh(111)
Surface Science. 1999. V.421. N1-2. P.191-203. DOI: 10.1016/S0039-6028(98)00855-3 publication_identifier_short.wos_identifier_type publication_identifier_short.scopus_identifier_type publication_identifier_short.rinz_identifier_type
Dates:
Submitted: Jul 28, 1998
Accepted: Nov 4, 1998
Published print: Feb 4, 1999
Published online: Feb 5, 1999
Identifiers:
publication_identifier.wos_identifier_type WOS:000078689400020
publication_identifier.scopus_identifier_type 2-s2.0-0033521828
publication_identifier.rinz_identifier_type 31839562
publication_identifier.accession_number_identifier_type 1999:143241
publication_identifier.chemical_accession_number_identifier_type 130:158959
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