Mechanism of the Decomposition of Rh2O3 Thin Films Full article
Journal |
Kinetics and Catalysis
ISSN: 0023-1584 , E-ISSN: 1608-3210 |
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Output data | Year: 1995, Volume: 36, Number: 3, Pages: 356-362 Pages count : 7 | ||
Tags | OXIDATION; RHODIUM; SURFACE; OXYGEN | ||
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Abstract:
The decomposition of Rh2O3 thin films (1 - 10 monolayers) for Rh(100) and polycrystalline rhodium at 400 - 1600 K is studied by thermodesorption (TD) and mathematical modeling. The decomposition of oxide films is accompanied by O-2 liberation at 800 - 900 K and by the appearance of the corresponding ''narrow'' beta(1) peak in the TD spectrum. The model of decomposition, in which the surface layer of the oxide film is continuously covered and its thickness gradually decreases, is considered.
Cite:
Salanov A.N.
, Savchenko V.I.
Mechanism of the Decomposition of Rh2O3 Thin Films
Kinetics and Catalysis. 1995. V.36. N3. P.356-362. WOS РИНЦ
Mechanism of the Decomposition of Rh2O3 Thin Films
Kinetics and Catalysis. 1995. V.36. N3. P.356-362. WOS РИНЦ
Original:
Саланов А.Н.
, Савченко В.И.
Механизм разложения тонких пленок оксида родия Rh2O3
Кинетика и катализ. 1995. Т.36. №3. С.392-398. РИНЦ
Механизм разложения тонких пленок оксида родия Rh2O3
Кинетика и катализ. 1995. Т.36. №3. С.392-398. РИНЦ
Dates:
Submitted: | Jan 19, 1993 |
Published print: | May 1, 1995 |
Identifiers:
Web of science | WOS:A1995RJ73100013 |
Elibrary | 30595846 |
Chemical Abstracts | 1995:707468 |
Chemical Abstracts (print) | 123:124186 |
Citing:
DB | Citing |
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Web of science | 2 |