Spectroscopic Ellipsometry Characterization of the Optical Properties and Thermal Stability of Zr O2 Films Made by Ion-Beam Assisted Deposition Full article
Journal |
Applied Physics Letters
ISSN: 0003-6951 , E-ISSN: 1077-3118 |
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Output data | Year: 2008, Volume: 92, Number: 1, Pages: 011917 Pages count : 3 DOI: 10.1063/1.2811955 | ||||||||
Tags | Ion beams; Spectroscopic ellipsometry; Surface tension | ||||||||
Authors |
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Affiliations |
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Funding (1)
1 | National Science Foundation | NSF-NIRT, EAR-0403732 |
Abstract:
The optical properties, interface structure, and thermal stability of the ZrO2 films grown on Si(100) were investigated in detail. A 2 nm thick interfacial layer (IL) is formed at the ZrO2–Si interface for the as-grown ZrO2. The optical constants of ZrO2 films and IL correspond to amorphous-ZrO2 and amorphous-SiO2, respectively. The oxidation and IL growth at 900 °C, as a function of annealing time, exhibit a two-step behavior with a slow and a fast growth-rate zones. The transition from a zone of slow to fast rate is attributed to structurally modified ZrO2 facilitating the faster oxygen transport to the ZrO2 /Si interface.
Cite:
Ramana C.V.
, Utsunomiya S.
, Ewing R.
, Becker U.
, Atuchin V.V.
, Aliev V.S.
, Kruchinin V.N.
Spectroscopic Ellipsometry Characterization of the Optical Properties and Thermal Stability of Zr O2 Films Made by Ion-Beam Assisted Deposition
Applied Physics Letters. 2008. V.92. N1. P.011917. DOI: 10.1063/1.2811955 WOS Scopus РИНЦ
Spectroscopic Ellipsometry Characterization of the Optical Properties and Thermal Stability of Zr O2 Films Made by Ion-Beam Assisted Deposition
Applied Physics Letters. 2008. V.92. N1. P.011917. DOI: 10.1063/1.2811955 WOS Scopus РИНЦ
Dates:
Submitted: | Aug 7, 2007 |
Accepted: | Oct 23, 2007 |
Published online: | Jan 7, 2008 |
Identifiers:
Web of science | WOS:000252284200055 |
Scopus | 2-s2.0-38049079638 |
Elibrary | 13584870 |
Chemical Abstracts | 2008:112105 |
Chemical Abstracts (print) | 148:271681 |
OpenAlex | W1988461102 |