Atomic Structure and Optical Properties of Plasma Enhanced Chemical Vapor Deposited SiCOH Low-k Dielectric Film Full article
Journal |
Optics and Spectroscopy
ISSN: 0030-400X , E-ISSN: 1562-6911 |
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Output data | Year: 2021, Volume: 129, Number: 5, Pages: 645–651 Pages count : 7 DOI: 10.1134/S0030400X21050088 | ||||||||||||||
Tags | atomic structure; low-k dielectrics; optical properties; PECVD | ||||||||||||||
Authors |
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Affiliations |
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Funding (1)
1 | Russian Foundation for Basic Research | 18-29-27006 (АААА-А19-119120490057-5) |
Abstract:
The SiCOH low-k dielectric film was grown on Si substrate using plasma-enhanced chemical vapor deposition method. Atomic structure and optical properties of the film were studied with the use of X‑ray photoelectron spectroscopy (XPS), Fourier transform infrared (FTIR) absorption spectroscopy, Raman spectroscopy, and ellipsometry. Analysis of XPS data showed that the low-k dielectric film consists of Si–O4 bonds (83%) and Si–SiO3 bonds (17%). In FTIR spectra some red-shift of Si–O–Si valence (stretching) vibration mode frequency was observed in the low-k dielectric film compared with the frequency of this mode in thermally grown SiO2 film. The peaks related to absorbance by C–H bonds were observed in FTIR spectrum. According to Raman spectroscopy data, the film contained local Si–Si bonds and also C‒C bonds in the s–p3 and s–p2 hybridized forms. Scanning laser ellipsometry data show that the film is quite homogeneous, homogeneity of thickness is ~2.5%, and homogeneity of refractive index is ~2%. According to the analysis of spectral ellipsometry data, the film is porous (porosity is about 24%) and contains clusters of amorphous carbon (~7%). © 2021, Pleiades Publishing, Ltd.
Cite:
Kruchinin V.N.
, Volodin V.A.
, Rykhlitskii S.V.
, Gritsenko V.A.
, Posvirin I.P.
, Shi X.
, Baklanov M.R.
Atomic Structure and Optical Properties of Plasma Enhanced Chemical Vapor Deposited SiCOH Low-k Dielectric Film
Optics and Spectroscopy. 2021. V.129. N5. P.645–651. DOI: 10.1134/S0030400X21050088 WOS Scopus РИНЦ
Atomic Structure and Optical Properties of Plasma Enhanced Chemical Vapor Deposited SiCOH Low-k Dielectric Film
Optics and Spectroscopy. 2021. V.129. N5. P.645–651. DOI: 10.1134/S0030400X21050088 WOS Scopus РИНЦ
Dates:
Submitted: | Oct 6, 2020 |
Accepted: | Dec 26, 2020 |
Published print: | Jun 1, 2021 |
Published online: | Dec 24, 2021 |
Identifiers:
Web of science | WOS:000733690900013 |
Scopus | 2-s2.0-85121644613 |
Elibrary | 47548361 |
Chemical Abstracts | 2021:2849976 |
OpenAlex | W4226157734 |