1
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Smirnova T.P.
,
Saraev A.A.
,
Korolkov I.V.
,
Kitchai V.N.
,
Borisov V.O.
The Crystal Structure of Solid Solutions Formed in the HfO2-Sc2O3 Nanoscale System
Journal of Crystal Growth. 2019.
V.523. 125156
:1-7. DOI: 10.1016/j.jcrysgro.2019.125156
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
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2
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Kaichev V.V.
,
Smirnova T.P.
,
Yakovkina L.V.
,
Ivanova E.V.
,
Zamoryanskaya M.V.
,
Saraev A.A.
,
Pustovarov V.A.
,
Perevalov T.V.
,
Gritsenko V.A.
Structure, Chemistry and Luminescence Properties of Dielectric LaxHf1-xOy Films
Materials Chemistry and Physics. 2016.
V.175. P.200-205. DOI: 10.1016/j.matchemphys.2016.03.019
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publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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3
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Smirnova T.P.
,
Yakovkina L.V.
,
Borisov V.O.
,
Kichai V.N.
,
Kaichev V.V.
,
Saraev A.A.
Growth, Chemical Composition, and Structure of Thin LaxHf1-xOy films on Si
Inorganic Materials. 2014.
V.50. N2. P.158-164. DOI: 10.1134/S0020168514020162
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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4
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Geng H.
,
Lin T.
,
Letha A.J.
,
Hwang H-L.
,
Kyznetsov F.A.
,
Smirnova T.P.
,
Saraev A.A.
,
Kaichev V.V.
Advanced Passivation Techniques for Si Solar Cells with High-κ Dielectric Materials
Applied Physics Letters. 2014.
V.105. N12. P.123905. DOI: 10.1063/1.4896619
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publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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5
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Kaichev V.V.
,
Ivanova E.V.
,
Zamoryanskaya M.V.
,
Smirnova T.P.
,
Yakovkina L.V.
,
Gritsenko V.A.
XPS and Cathodoluminescence Studies of HfO2, Sc2O3 and (HfO2)1-x(Sc2O3)x Films
The European Physical Journal - Applied Physics. 2013.
V.64. N1. P.10302-1-4. DOI: 10.1051/epjap/2013130005
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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6
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Yakovkina L.V.
,
Smirnova T.P.
,
Borisov V.O.
,
Kichai V.N.
,
Kaichev V.V.
Synthesis and Properties of Dielectric (HfO2)1 − x (Sc2O3) x Films
Inorganic Materials. 2013.
V.49. N2. P.172-178. DOI: 10.1134/S0020168513020234
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publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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7
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Smirnova T.P.
,
Yakovkina L.V.
,
Borisov V.O.
,
Kichai V.N.
,
Kaichev V.V.
,
Kriventsov V.V.
Structure of HfO2 Films and Binary Oxides on Its Base
Journal of Structural Chemistry. 2012.
V.53. N4. P.708-714. DOI: 10.1134/S0022476612040130
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
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8
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Kaichev V.V.
,
Dubinin Y.V.
,
Smirnova T.P.
,
Lebedev M.S.
A Study of the Structure of (HfO2 ) x (Al2 O3)1−x /Si Films by X-Ray Photoelectron Spectroscopy
Journal of Structural Chemistry. 2011.
V.52. N3. P.480-487. DOI: 10.1134/S002247661103005X
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publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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9
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Smirnova T.P.
,
Lebedev M.S.
,
Morozova N.B.
,
Semyannikov P.P.
,
Zherikova K.V.
,
Kaichev V.V.
,
Dubinin Y.V.
MOCVD and Physicochemical Characterization of (HfO2)x(Al2O3)1-x Thin Films
Chemical Vapor Deposition. 2010.
V.16. N4-6. P.185-190. DOI: 10.1002/cvde.201006840
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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10
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Smirnova T.P.
,
Yakovkina L.V.
,
Beloshapkin S.A.
,
Kaichev V.V.
,
Alferova N.I.
,
Jeong-Hwan S.
Interfaces Analysis of the HfO2/SiO2/Si Structure
Journal of Physics and Chemistry of Solids. 2010.
V.71. N5. P.836-840. DOI: 10.1016/j.jpcs.2010.02.010
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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11
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Smirnova T.P.
,
Kuznetsov F.A.
,
Yakovkina L.
,
Kaichev V.
,
Kosyakov V.
,
Lebedev M.
,
Kichai V.
HfO2-High-k Dielectric for Nanoelectronics
ECS Transactions. 2009.
V.25. N8. P.875-880. DOI: 10.1149/1.3207680
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publication_identifier_short.scopus_identifier_type
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12
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Lebedev M.S.
,
Smirnova T.P.
,
Kaichev V.V.
Thin Films of (HfO2)x(Al2O 3)1-x Alloys: Preparation, Chemical Structure and Dielectric Properties
International Workshop and Tutorials on Electron Devices and Materials, EDM - Proceedings. 2009.
P.32-36. DOI: 10.1109/EDM.2009.5173920
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publication_identifier_short.scopus_identifier_type
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13
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Rastorguev A.A.
,
Belyi V.I.
,
Smirnova T.P.
,
Yakovkina L.V.
Photoluminescence Study of the Electronic Structure of HfO2 Films
Journal of Structural Chemistry. 2008.
V.49. N1. P.21-30. DOI: 10.1007/s10947-008-0004-9
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publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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14
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Smirnova T.P.
,
Badalyan A.M.
,
Borisov V.O.
,
Bakhturova L.F.
,
Kaichev V.V.
,
Podgorbunskaya T.A.
,
Rakhlin V.I.
Plasma-Chemical Deposition of SiCN Films from Volatile N-Bromhexamethyldisilazane
Inorganic Materials. 2008.
V.44. N12. P.1312-1318. DOI: 10.1134/S0020168508120091
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publication_identifier_short.scopus_identifier_type
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15
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Smirnova T.P.
,
Kaichev V.V.
,
Yakovkina L.V.
,
Kosyakov V.I.
,
Beloshapkin S.A.
,
Kuznetsov F.A.
,
Lebedev M.S.
,
Gritsenko V.A.
Composition and Structure of Hafnia Films on Silicon
Inorganic Materials. 2008.
V.44. N9. P.965-970. DOI: 10.1134/S0020168508090124
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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16
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Smirnova T.P.
,
Yakovkina L.V.
,
Kitchai V.N.
,
Kaichev V.V.
,
Shubin Y.V.
,
Morozova N.B.
,
Zherikova K.V.
Chemical Vapor Deposition and Characterization of Hafnium Oxide Films
Journal of Physics and Chemistry of Solids. 2008.
V.69. N2-3. P.685-687. DOI: 10.1016/j.jpcs.2007.07.123
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
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17
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Smirnova T.P.
,
Badalyan A.M.
,
Borisov V.O.
,
Kaichev V.V.
,
Bakhturova L.F.
,
Kichai V.N.
,
Rakhlin V.I.
,
Shainyan B.A.
Plasma Deposition and Properties of Silicon Carbonitride Films
Inorganic Materials. 2005.
V.41. N7. P.706-712. DOI: 10.1007/s10789-005-0195-9
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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18
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Yakovkina L.V.
,
Kichai V.N.
,
Smirnova T.P.
,
Kaichev V.V.
,
Shubin Y.V.
,
Morozova N.B.
,
Zherikova K.V.
,
Igumenov I.K.
Preparation and Properties of Thin HfO2 Films
Inorganic Materials. 2005.
V.41. N12. P.1300-1304. DOI: 10.1007/s10789-005-0305-8
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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19
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Smirnova T.P.
,
Badalyan A.M.
,
Borisov V.O.
,
Yakovkina L.V.
,
Kaichev V.V.
,
Shmakov A.N.
,
Nartova A.V.
,
Rakhlin V.I.
,
Fomina A.N.
Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition
Journal of Structural Chemistry. 2003.
V.44. N1. P.169-173. DOI: 10.1023/A:1024953518950
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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20
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Smirnova T.P.
,
Badalyan A.M.
,
Borisov V.O.
,
Yakovkina L.V.
,
Kaichev V.V.
,
Shmakov A.N.
,
Nartova A.V.
,
Rakhlin V.I.
,
Fomina A.N.
Plasma-Enhanced Chemical Vapor Deposition of Silicon Carbonitride Films from Volatile Silyl Derivatives of 1,1-Dimethylhydrazine
High Energy Chemistry. 2003.
V.37. N5. P.303-309. DOI: 10.1023/A:1025700829352
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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21
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Smirnova T.P.
,
Badalyan A.M.
,
Yakovkina L.V.
,
Shmakov A.N.
,
Asanov I.P.
,
Borisov V.O.
Composition and Structure of Films Deposited from Silyl Derivatives of Asymmetrical Dimethylhydrazine
Inorganic Materials. 2003.
V.39. N2. P.117-122. DOI: 10.1023/A:1022186310997
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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22
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Smirnova T.P.
,
Badalian A.M.
,
Yakovkina L.V.
,
Kaichev V.V.
,
Bukhtiyarov V.I.
,
Shmakov A.N.
,
Asanov I.P.
,
Rachlin V.I.
,
Fomina A.N.
SiCN Alloys Obtained by Remote Plasma Chemical Vapour Deposition from Novel Precursors
Thin Solid Films. 2003.
V.429. N1-2. P.144-151. DOI: 10.1016/S0040-6090(03)00408-5
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
publication_identifier_short.rinz_identifier_type
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23
|
Badalyan A.M.
,
Belyi V.I.
,
Gel'fond N.V.
,
Igumenov I.K.
,
Kosinova M.L.
,
Morozova N.B.
,
Rastorguev A.A.
,
Rumyantsev Y.M.
,
Smirnova T.P.
,
Fainer N.I.
,
Yakovkina L.V.
Chemical Composition and Structure of Thin Films Produced by Chemical Vapor Deposition
Journal of Structural Chemistry. 2002.
V.43. N4. P.556-580. DOI: 10.1023/A:1022084017202
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
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24
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Smirnova T.P.
,
Badalyan A.M.
,
Yakovkina L.V.
,
Sysoeva N.P.
,
Asanov I.P.
,
Kaichev V.V.
,
Bukhtiyarov V.I.
,
Shmakov A.N.
,
Rakhlin V.I.
,
Fomina A.N.
Silicon Carbonitride Films as a Promising Material Synthesized from New Sources
Chemistry for Sustainable Development. 2001.
V.9. N7. P.23-29.
publication_identifier_short.rinz_identifier_type
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25
|
Smirnova T.P.
,
Jakovkina L.V.
,
Jashkin I.L.
,
Sysoeva N.P.
,
Amosov J.I.
Boron Nitride Films Prepared by Remote Plasma-Enhanced Chemical Vapour Deposition from Borazine (B3N3H6)
Thin Solid Films. 1994.
V.237. N1-2. P.32-37. DOI: 10.1016/0040-6090(94)90235-6
publication_identifier_short.wos_identifier_type
publication_identifier_short.scopus_identifier_type
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