Smirnova Tamara Pavlovna

Identifiers

Elibrary ID: 43253

Affiliations

#	Name	Period	Items
1	Nikolaev Institute of Inorganic Chemistry SB RAS	1994 - 2019	43
2	National Research Tomsk State University	2008	1

Science activity

Articles in journal - 25 , Articles in compilations - 1

Articles in journal (25) More info

1	Smirnova T.P. , Saraev A.A. , Korolkov I.V. , Kitchai V.N. , Borisov V.O. The Crystal Structure of Solid Solutions Formed in the HfO2-Sc2O3 Nanoscale System Journal of Crystal Growth. 2019. V.523. 125156 :1-7. DOI: 10.1016/j.jcrysgro.2019.125156 Scopus WOS РИНЦ AN: 2019:1428726 CAN: 171:335927
2	Kaichev V.V. , Smirnova T.P. , Yakovkina L.V. , Ivanova E.V. , Zamoryanskaya M.V. , Saraev A.A. , Pustovarov V.A. , Perevalov T.V. , Gritsenko V.A. Structure, Chemistry and Luminescence Properties of Dielectric LaxHf1-xOy Films Materials Chemistry and Physics. 2016. V.175. P.200-205. DOI: 10.1016/j.matchemphys.2016.03.019 WOS Scopus РИНЦ AN: 2016:485669 CAN: 164:490469
3	Smirnova T.P. , Yakovkina L.V. , Borisov V.O. , Kichai V.N. , Kaichev V.V. , Saraev A.A. Growth, Chemical Composition, and Structure of Thin LaxHf1-xOy films on Si Inorganic Materials. 2014. V.50. N2. P.158-164. DOI: 10.1134/S0020168514020162 WOS Scopus РИНЦ AN: 2014:149183 CAN: 161:411025
4	Geng H. , Lin T. , Letha A.J. , Hwang H-L. , Kyznetsov F.A. , Smirnova T.P. , Saraev A.A. , Kaichev V.V. Advanced Passivation Techniques for Si Solar Cells with High-κ Dielectric Materials Applied Physics Letters. 2014. V.105. N12. P.123905. DOI: 10.1063/1.4896619 WOS Scopus РИНЦ AN: 2014:1611916 CAN: 161:553147
5	Kaichev V.V. , Ivanova E.V. , Zamoryanskaya M.V. , Smirnova T.P. , Yakovkina L.V. , Gritsenko V.A. XPS and Cathodoluminescence Studies of HfO2, Sc2O3 and (HfO2)1-x(Sc2O3)x Films The European Physical Journal - Applied Physics. 2013. V.64. N1. P.10302-1-4. DOI: 10.1051/epjap/2013130005 WOS Scopus РИНЦ AN: 2013:1828504 CAN: 160:700552
6	Yakovkina L.V. , Smirnova T.P. , Borisov V.O. , Kichai V.N. , Kaichev V.V. Synthesis and Properties of Dielectric (HfO2)1 − x (Sc2O3) x Films Inorganic Materials. 2013. V.49. N2. P.172-178. DOI: 10.1134/S0020168513020234 WOS Scopus РИНЦ AN: 2013:17664 CAN: 159:112019
7	Smirnova T.P. , Yakovkina L.V. , Borisov V.O. , Kichai V.N. , Kaichev V.V. , Kriventsov V.V. Structure of HfO2 Films and Binary Oxides on Its Base Journal of Structural Chemistry. 2012. V.53. N4. P.708-714. DOI: 10.1134/S0022476612040130 WOS Scopus РИНЦ AN: 2012:1425851 CAN: 158:432954
8	Kaichev V.V. , Dubinin Y.V. , Smirnova T.P. , Lebedev M.S. A Study of the Structure of (HfO2 ) x (Al2 O3)1−x /Si Films by X-Ray Photoelectron Spectroscopy Journal of Structural Chemistry. 2011. V.52. N3. P.480-487. DOI: 10.1134/S002247661103005X WOS Scopus РИНЦ AN: 2011:947680 CAN: 155:601881
9	Smirnova T.P. , Lebedev M.S. , Morozova N.B. , Semyannikov P.P. , Zherikova K.V. , Kaichev V.V. , Dubinin Y.V. MOCVD and Physicochemical Characterization of (HfO2)x(Al2O3)1-x Thin Films Chemical Vapor Deposition. 2010. V.16. N4-6. P.185-190. DOI: 10.1002/cvde.201006840 WOS Scopus РИНЦ AN: 2010:861686 CAN: 155:550591
10	Smirnova T.P. , Yakovkina L.V. , Beloshapkin S.A. , Kaichev V.V. , Alferova N.I. , Jeong-Hwan S. Interfaces Analysis of the HfO2/SiO2/Si Structure Journal of Physics and Chemistry of Solids. 2010. V.71. N5. P.836-840. DOI: 10.1016/j.jpcs.2010.02.010 WOS Scopus РИНЦ AN: 2010:450758 CAN: 154:501204
11	Smirnova T.P. , Kuznetsov F.A. , Yakovkina L. , Kaichev V. , Kosyakov V. , Lebedev M. , Kichai V. HfO2-High-k Dielectric for Nanoelectronics ECS Transactions. 2009. V.25. N8. P.875-880. DOI: 10.1149/1.3207680 WOS Scopus РИНЦ AN: 2009:1370864 CAN: 153:322862
12	Lebedev M.S. , Smirnova T.P. , Kaichev V.V. Thin Films of (HfO2)x(Al2O 3)1-x Alloys: Preparation, Chemical Structure and Dielectric Properties International Workshop and Tutorials on Electron Devices and Materials, EDM - Proceedings. 2009. P.32-36. DOI: 10.1109/EDM.2009.5173920 WOS Scopus РИНЦ
13	Rastorguev A.A. , Belyi V.I. , Smirnova T.P. , Yakovkina L.V. Photoluminescence Study of the Electronic Structure of HfO2 Films Journal of Structural Chemistry. 2008. V.49. N1. P.21-30. DOI: 10.1007/s10947-008-0004-9 WOS Scopus РИНЦ AN: 2008:536234 CAN: 149:186065
14	Smirnova T.P. , Badalyan A.M. , Borisov V.O. , Bakhturova L.F. , Kaichev V.V. , Podgorbunskaya T.A. , Rakhlin V.I. Plasma-Chemical Deposition of SiCN Films from Volatile N-Bromhexamethyldisilazane Inorganic Materials. 2008. V.44. N12. P.1312-1318. DOI: 10.1134/S0020168508120091 WOS Scopus РИНЦ AN: 2008:1474885 CAN: 150:380620
15	Smirnova T.P. , Kaichev V.V. , Yakovkina L.V. , Kosyakov V.I. , Beloshapkin S.A. , Kuznetsov F.A. , Lebedev M.S. , Gritsenko V.A. Composition and Structure of Hafnia Films on Silicon Inorganic Materials. 2008. V.44. N9. P.965-970. DOI: 10.1134/S0020168508090124 WOS Scopus РИНЦ AN: 2008:1055854 CAN: 150:110130
16	Smirnova T.P. , Yakovkina L.V. , Kitchai V.N. , Kaichev V.V. , Shubin Y.V. , Morozova N.B. , Zherikova K.V. Chemical Vapor Deposition and Characterization of Hafnium Oxide Films Journal of Physics and Chemistry of Solids. 2008. V.69. N2-3. P.685-687. DOI: 10.1016/j.jpcs.2007.07.123 WOS Scopus РИНЦ AN: 2008:171551 CAN: 149:483743
17	Smirnova T.P. , Badalyan A.M. , Borisov V.O. , Kaichev V.V. , Bakhturova L.F. , Kichai V.N. , Rakhlin V.I. , Shainyan B.A. Plasma Deposition and Properties of Silicon Carbonitride Films Inorganic Materials. 2005. V.41. N7. P.706-712. DOI: 10.1007/s10789-005-0195-9 WOS Scopus РИНЦ AN: 2005:668642 CAN: 144:297223
18	Yakovkina L.V. , Kichai V.N. , Smirnova T.P. , Kaichev V.V. , Shubin Y.V. , Morozova N.B. , Zherikova K.V. , Igumenov I.K. Preparation and Properties of Thin HfO2 Films Inorganic Materials. 2005. V.41. N12. P.1300-1304. DOI: 10.1007/s10789-005-0305-8 WOS Scopus РИНЦ AN: 2005:1321974 CAN: 145:93995
19	Smirnova T.P. , Badalyan A.M. , Borisov V.O. , Yakovkina L.V. , Kaichev V.V. , Shmakov A.N. , Nartova A.V. , Rakhlin V.I. , Fomina A.N. Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition Journal of Structural Chemistry. 2003. V.44. N1. P.169-173. DOI: 10.1023/A:1024953518950 WOS Scopus РИНЦ AN: 2003:575830 CAN: 139:384750
20	Smirnova T.P. , Badalyan A.M. , Borisov V.O. , Yakovkina L.V. , Kaichev V.V. , Shmakov A.N. , Nartova A.V. , Rakhlin V.I. , Fomina A.N. Plasma-Enhanced Chemical Vapor Deposition of Silicon Carbonitride Films from Volatile Silyl Derivatives of 1,1-Dimethylhydrazine High Energy Chemistry. 2003. V.37. N5. P.303-309. DOI: 10.1023/A:1025700829352 WOS Scopus РИНЦ AN: 2003:720258 CAN: 140:80745
21	Smirnova T.P. , Badalyan A.M. , Yakovkina L.V. , Shmakov A.N. , Asanov I.P. , Borisov V.O. Composition and Structure of Films Deposited from Silyl Derivatives of Asymmetrical Dimethylhydrazine Inorganic Materials. 2003. V.39. N2. P.117-122. DOI: 10.1023/A:1022186310997 WOS Scopus РИНЦ AN: 2003:75235 CAN: 138:393203
22	Smirnova T.P. , Badalian A.M. , Yakovkina L.V. , Kaichev V.V. , Bukhtiyarov V.I. , Shmakov A.N. , Asanov I.P. , Rachlin V.I. , Fomina A.N. SiCN Alloys Obtained by Remote Plasma Chemical Vapour Deposition from Novel Precursors Thin Solid Films. 2003. V.429. N1-2. P.144-151. DOI: 10.1016/S0040-6090(03)00408-5 WOS Scopus РИНЦ AN: 2003:311682 CAN: 139:217803
23	Badalyan A.M. , Belyi V.I. , Gel'fond N.V. , Igumenov I.K. , Kosinova M.L. , Morozova N.B. , Rastorguev A.A. , Rumyantsev Y.M. , Smirnova T.P. , Fainer N.I. , Yakovkina L.V. Chemical Composition and Structure of Thin Films Produced by Chemical Vapor Deposition Journal of Structural Chemistry. 2002. V.43. N4. P.556-580. DOI: 10.1023/A:1022084017202 WOS Scopus РИНЦ AN: 2003:46810 CAN: 138:291314
24	Smirnova T.P. , Badalyan A.M. , Yakovkina L.V. , Sysoeva N.P. , Asanov I.P. , Kaichev V.V. , Bukhtiyarov V.I. , Shmakov A.N. , Rakhlin V.I. , Fomina A.N. Silicon Carbonitride Films as a Promising Material Synthesized from New Sources Chemistry for Sustainable Development. 2001. V.9. N7. P.23-29. РИНЦ
25	Smirnova T.P. , Jakovkina L.V. , Jashkin I.L. , Sysoeva N.P. , Amosov J.I. Boron Nitride Films Prepared by Remote Plasma-Enhanced Chemical Vapour Deposition from Borazine (B3N3H6) Thin Solid Films. 1994. V.237. N1-2. P.32-37. DOI: 10.1016/0040-6090(94)90235-6 WOS Scopus РИНЦ AN: 1994:142044 CAN: 120:142044

Articles in compilations (1) More info

Smirnova T.P. , Shmakov A.N. , Badalyan A.M. , Kaichev V.V. , Bukhtiyarov V.I. , Rakhlin V.I. , Fomina A.N.
Silicon Carbonitride Films as New Materials Obtained by Plasma Chemical Vapor Deposition from Novel Precursor
In compilation Complex Mediums II: Beyond Linear Isotropic Dielectrics : International Symposium on Optical Science and Technology. 2001. – C.366-376. DOI: 10.1117/12.432950 WOS Scopus РИНЦ AN: 2001:856361 CAN: 136:23976