Lebedev Mikhail Sergeevich
author_identifier.rinz_author_identifier_type:
991863
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1 |
Nikolaev Institute of Inorganic Chemistry SB RAS
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2008 - 2019
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10
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Articles in journal - 7
Articles in journal (7)
More info
1
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Lebedev M.S.
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Kruchinin V.N.
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Afonin M.Y.
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Korolkov I.V.
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Saraev A.A.
,
Gismatulin A.A.
,
Gritsenko V.A.
Optical Properties and Charge Transport of Textured Sc2O3 Thin Flms Obtained by Atomic Layer Deposition
Applied Surface Science. 2019.
V.478. P.690-698. DOI: 10.1016/j.apsusc.2019.01.288
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2
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Lebedev M.S.
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Khmel S.Y.
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Lyulyukin M.N.
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Petukhova D.E.
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Barsukov A.V.
Low-Temperature Fabrication of SiOx-TiO2 Core-Shell Nanowires for Photocatalytic Application
Vacuum. 2019.
V.165. P.51-57. DOI: 10.1016/j.vacuum.2019.03.059
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3
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Kaichev V.V.
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Dubinin Y.V.
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Smirnova T.P.
,
Lebedev M.S.
A Study of the Structure of (HfO2 ) x (Al2 O3)1−x /Si Films by X-Ray Photoelectron Spectroscopy
Journal of Structural Chemistry. 2011.
V.52. N3. P.480-487. DOI: 10.1134/S002247661103005X
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4
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Smirnova T.P.
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Lebedev M.S.
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Morozova N.B.
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Semyannikov P.P.
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Zherikova K.V.
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Kaichev V.V.
,
Dubinin Y.V.
MOCVD and Physicochemical Characterization of (HfO2)x(Al2O3)1-x Thin Films
Chemical Vapor Deposition. 2010.
V.16. N4-6. P.185-190. DOI: 10.1002/cvde.201006840
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5
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Smirnova T.P.
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Kuznetsov F.A.
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Yakovkina L.
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Kaichev V.
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Kosyakov V.
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Lebedev M.
,
Kichai V.
HfO2-High-k Dielectric for Nanoelectronics
ECS Transactions. 2009.
V.25. N8. P.875-880. DOI: 10.1149/1.3207680
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6
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Lebedev M.S.
,
Smirnova T.P.
,
Kaichev V.V.
Thin Films of (HfO2)x(Al2O 3)1-x Alloys: Preparation, Chemical Structure and Dielectric Properties
International Workshop and Tutorials on Electron Devices and Materials, EDM - Proceedings. 2009.
P.32-36. DOI: 10.1109/EDM.2009.5173920
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7
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Smirnova T.P.
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Kaichev V.V.
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Yakovkina L.V.
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Kosyakov V.I.
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Beloshapkin S.A.
,
Kuznetsov F.A.
,
Lebedev M.S.
,
Gritsenko V.A.
Composition and Structure of Hafnia Films on Silicon
Inorganic Materials. 2008.
V.44. N9. P.965-970. DOI: 10.1134/S0020168508090124
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