Synthesis of Si–C–N–Fe Films from Volatile Organosilicon Substances-Precursors and Ferrocene. Part II. Properties of SiCxNyFez Films Obtained by Thermal Decomposition of Tris(Diethylamino)Silane and Ferrocene Научная публикация
Журнал |
Glass Physics and Chemistry
ISSN: 1087-6596 , E-ISSN: 1608-313X |
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Вых. Данные | Год: 2016, Том: 42, Номер: 5, Страницы: 490-496 Страниц : 7 DOI: 10.1134/S1087659616050126 | ||||||
Ключевые слова | ferrocene, low-pressure chemical vapor deposition of films, nanocomposite films, thermodynamic modeling, tris(diethylamino)silane | ||||||
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Реферат:
Thermodynamic modeling of the deposition of condensed phases of complex composition has
been carried out in the Si–C–N–Fe–H–(He) system in the temperature range of 500–1300 K under total
pressure of 10–2–10–1 Torr in the system using initial gas mixture of tris(diethylamino)silane
HSi[N(C2H5)2]3, ferrocene (C5H5)2Fe, and helium. Derived from the results of thermodynamic modeling,
the method for the preparation of SiCxNyFez films using the high-temperature decomposition of the gas mixture
of TDEAS, ferrocene, and helium at low pressure in the temperature range of 1073–1273 K has been
developed. The dependence of the chemical and phase composition of the films on the conditions of synthesis
has been determined using various methods of chemical analysis such as IR spectroscopy, Raman scattering,
scanning electron microscopy, energy dispersion spectroscopy, X-ray phase analysis using synchrotron
radiation, and X-ray photoelectron spectroscopy (XPS). The magnetic properties of the films have been studied
by Faraday’s method and electron paramagnetic resonance. It has been shown that the films are paramagnetic
at the temperature of synthesis of 1123 K, while at the deposition temperature of 1273 K they are ferromagnetic.
The mechanical properties of the films were characterized by nanoindentation technique.
Библиографическая ссылка:
Pushkarev R.V.
, Fainer N.I.
, Golubenko A.N.
, Rumyantsev Y.M.
, Nadolinnyi V.A.
, Maksimovskii E.A.
, Korotaev E.V.
, Kaichev V.V.
Synthesis of Si–C–N–Fe Films from Volatile Organosilicon Substances-Precursors and Ferrocene. Part II. Properties of SiCxNyFez Films Obtained by Thermal Decomposition of Tris(Diethylamino)Silane and Ferrocene
Glass Physics and Chemistry. 2016. V.42. N5. P.490-496. DOI: 10.1134/S1087659616050126 WOS Scopus РИНЦ
Synthesis of Si–C–N–Fe Films from Volatile Organosilicon Substances-Precursors and Ferrocene. Part II. Properties of SiCxNyFez Films Obtained by Thermal Decomposition of Tris(Diethylamino)Silane and Ferrocene
Glass Physics and Chemistry. 2016. V.42. N5. P.490-496. DOI: 10.1134/S1087659616050126 WOS Scopus РИНЦ
Оригинальная версия:
Пушкарев Р.В.
, Файнер Н.И.
, Голубенко А.Н.
, Румянцев Ю.М.
, Надолинный В.А.
, Максимовский Е.А.
, Коротаев Е.В.
, Каичев В.В.
Синтез пленок Si—C—N—Fe из летучих кремнийорганических веществ-предшественников и ферроцена. Часть II. Свойства пленок SiCxNyFez, полученных термическим разложением трис(диэтиламино)силана и ферроцена
Физика и химия стекла. 2016. Т.42. №5. С.65-73. РИНЦ
Синтез пленок Si—C—N—Fe из летучих кремнийорганических веществ-предшественников и ферроцена. Часть II. Свойства пленок SiCxNyFez, полученных термическим разложением трис(диэтиламино)силана и ферроцена
Физика и химия стекла. 2016. Т.42. №5. С.65-73. РИНЦ
Даты:
Поступила в редакцию: | 22 дек. 2015 г. |
Опубликована в печати: | 1 сент. 2016 г. |
Опубликована online: | 2 окт. 2016 г. |
Идентификаторы БД:
Web of science | WOS:000385185500010 |
Scopus | 2-s2.0-84989299201 |
РИНЦ | 27570715 |
Chemical Abstracts | 2016:1608239 |
OpenAlex | W2525362264 |