Chemical Vapor Deposition and Characterization of Hafnium Oxide Films Full article
Conference |
2nd International Symposium on Point Defect and Non-Stoichiometry 04-05 Oct 2005 , Kaohsiung |
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Journal |
Journal of Physics and Chemistry of Solids
ISSN: 0022-3697 |
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Output data | Year: 2008, Volume: 69, Number: 2-3, Pages: 685-687 Pages count : 3 DOI: 10.1016/j.jpcs.2007.07.123 | ||||||
Tags | Oxides, Thin films, Vapour deposition, Photoelectron spectroscopy | ||||||
Authors |
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Affiliations |
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Funding (2)
1 | Russian Foundation for Basic Research | 05-03-32393 |
2 | The Ministry of Education and Science of the Russian Federation | 02.435.11.2012 |
Abstract:
HfO2 layers were grown on silicon by metalorganic chemical vapor deposition using (C5H5)2Hf(CH3)2, (C5H5)2Hf(N(C2H5)2)2 and Hf(dpm)4 as volatile precursors and were characterized by IR, XP, ED-spectroscopy, X-ray diffraction, ellipsometry and electrophysical methods. The films were shown to consist of monoclinic HfO2 and to contain hafnium silicide and silicate at the HfO2/Si interface. The presence of hafnium silicide was attributed to oxygen deficiency induced by argon ion sputtering of the film during XPS analysis. Hafnium silicate was formed as a result of the reaction between hafnia and silicon oxides during annealing. Current–voltage and capacitance–voltage measurements on Al/HfO2/Si test structures were used to determine the dielectric permittivity and electrical
resistivity of the films: k ¼ 15–20, r ¼ 1015 O cm
Cite:
Smirnova T.P.
, Yakovkina L.V.
, Kitchai V.N.
, Kaichev V.V.
, Shubin Y.V.
, Morozova N.B.
, Zherikova K.V.
Chemical Vapor Deposition and Characterization of Hafnium Oxide Films
Journal of Physics and Chemistry of Solids. 2008. V.69. N2-3. P.685-687. DOI: 10.1016/j.jpcs.2007.07.123 WOS Scopus РИНЦ
Chemical Vapor Deposition and Characterization of Hafnium Oxide Films
Journal of Physics and Chemistry of Solids. 2008. V.69. N2-3. P.685-687. DOI: 10.1016/j.jpcs.2007.07.123 WOS Scopus РИНЦ
Dates:
Published online: | Aug 8, 2007 |
Published print: | Feb 1, 2008 |
Identifiers:
Web of science | WOS:000253874700093 |
Scopus | 2-s2.0-38749135831 |
Elibrary | 13571095 |
Chemical Abstracts | 2008:171551 |
Chemical Abstracts (print) | 149:483743 |
OpenAlex | W1982025166 |