Electronic Structure and Nanoscale Potential Fluctuations in Strongly Nonstoichiometric PECVD SiOx Full article
Journal |
Journal of Non-Crystalline Solids
ISSN: 0022-3093 , E-ISSN: 1873-4812 |
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Output data | Year: 2020, Volume: 529, Article number : 119796, Pages count : 4 DOI: 10.1016/j.jnoncrysol.2019.119796 | ||||||||
Tags | Dielectric; FTIR; HRTEM; PECVD; Raman scattering; SiO2; XPS | ||||||||
Authors |
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Affiliations |
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Funding (2)
1 | Ministry of Science and Higher Education of the Russian Federation | 0306-2019-0005 |
2 | Russian Science Foundation | 19-19-00286 (АААА-А19-119120490056-8) |
Abstract:
The electronic structures of SiOx:H films synthesized by plasma-enhanced chemical vapor deposition on silicon and glass substrates were studied. The film stoichiometric parameter x varied in the range from 0.57 to 2 depending on the oxygen supply to the reactor conditions. According to XPS, Raman scattering and high-resolution electron microscopy, a core-shell model of the a-SiOx:H structure was applied. According to this model, the films consist of silicon suboxide SiOy, in which clusters of different compositions are introduced — from amorphous silicon to silicon oxide — with a characteristic size of 2–10 nm. The SiOx:H energy diagram was constructed. The nanoscale potential fluctuations model, according to which Si nanoclusters are potential wells for electrons and holes in SiOx, is proposed. The data obtained are important for the correct interpretation of the charge transport in a-SiOx:H films, and they are important for the development of nonvolatile memory elements on their basis. © 2019 Elsevier B.V.
Cite:
Perevalov T.V.
, Volodin V.A.
, Kamaev G.N.
, Krivyakin G.K.
, Gritsenko V.A.
, Prosvirin I.P.
Electronic Structure and Nanoscale Potential Fluctuations in Strongly Nonstoichiometric PECVD SiOx
Journal of Non-Crystalline Solids. 2020. V.529. 119796 :1-4. DOI: 10.1016/j.jnoncrysol.2019.119796 WOS Scopus РИНЦ
Electronic Structure and Nanoscale Potential Fluctuations in Strongly Nonstoichiometric PECVD SiOx
Journal of Non-Crystalline Solids. 2020. V.529. 119796 :1-4. DOI: 10.1016/j.jnoncrysol.2019.119796 WOS Scopus РИНЦ
Dates:
Submitted: | Aug 30, 2019 |
Accepted: | Nov 12, 2019 |
Published online: | Dec 11, 2019 |
Published print: | Feb 1, 2020 |
Identifiers:
Web of science | WOS:000513291200015 |
Scopus | 2-s2.0-85076261687 |
Elibrary | 43212075 |
Chemical Abstracts | 2019:2407541 |
OpenAlex | W2995756773 |