Formation and Decomposition of Thin Rhodium Oxide Films Научная публикация
| Журнал |
Reaction Kinetics and Catalysis Letters
ISSN: 0133-1736 , E-ISSN: 1588-2837 |
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| Вых. Данные | Год: 1993, Том: 49, Номер: 1, Страницы: 29-37 Страниц : 9 DOI: 10.1007/BF02084025 | ||
| Ключевые слова | Spectroscopy; Catalysis; Surface Layer; Electron Transfer; Decomposition; Desorption; Film growth; Films; Oxides | ||
| Авторы |
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| Организации |
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Реферат:
Interaction of O2 with Rh (poly) and Rh (100) has been studied by Auger Electron Spectroscopy and thermal desorption method at O2 pressures of 10−5 – 103 Pa and at 400–1600 K. At P(O2)<10−5 Pa chemisorption of O2 occurs, at
P(O2)=10−5 – 10−1 Pa surface oxides are formed, at P(O2)>1.0 Pa a bulk Rh2O3 oxide starts to grow. The growth of rhodium oxide film proceeds via the Cabrera-Mott mechanism. Its decomposition occurs via a mechanism including electron transfer across the oxide film, O2 desorption from the surface layer and rearrangement of the oxide layer.
Библиографическая ссылка:
Salanov A.N.
, Savchenko V.I.
Formation and Decomposition of Thin Rhodium Oxide Films
Reaction Kinetics and Catalysis Letters. 1993. V.49. N1. P.29-37. DOI: 10.1007/BF02084025 WOS Scopus РИНЦ CAPlusCA OpenAlex
Formation and Decomposition of Thin Rhodium Oxide Films
Reaction Kinetics and Catalysis Letters. 1993. V.49. N1. P.29-37. DOI: 10.1007/BF02084025 WOS Scopus РИНЦ CAPlusCA OpenAlex
Даты:
| Поступила в редакцию: | 23 окт. 1992 г. |
| Принята к публикации: | 4 янв. 1993 г. |
| Опубликована в печати: | 1 апр. 1993 г. |
Идентификаторы БД:
| Web of science: | WOS:A1993LN63100005 |
| Scopus: | 2-s2.0-0027574814 |
| РИНЦ: | 31146926 |
| Chemical Abstracts: | 1993:634953 |
| Chemical Abstracts (print): | 119:234953 |
| OpenAlex: | W2055624960 |