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The Activity and Thermal Stability of RhOx/CeO2 Nanocomposites Prepared by Radio-Frequency Plasma Sputtering Full article

Conference 18th European Conference on Applications of Surface and Interface Analysis
15-20 Sep 2019 , Dresden
Journal Surface and Interface Analysis
ISSN: 0142-2421 , E-ISSN: 1096-9918
Output data Year: 2020, Volume: 52, Number: 12, Pages: 818-822 Pages count : 5 DOI: 10.1002/sia.6879
Tags ceria; RF plasma sputtering; rhodium; Rh–CeO2 interaction; XPS
Authors Kibis Lidiya S. 1,2 , Krotova Alena I. 1,2 , Zaikovskii Vladimir I. 1,2 , Boronin Andrei I. 1,2
Affiliations
1 Departments of Heterogeneous Catalysis and Physicochemical Methods for Catalyst Investigation, Boreskov Institute of Catalysis SB RAS, Lavrentieva 5, Novosibirsk, 630090, Russia
2 Departments of Natural Sciences and Physics, Novosibirsk State University, Pirogova 2, Novosibirsk, 630090, Russia

Funding (2)

1 Federal Agency for Scientific Organizations 0303-2016-0003
2 Russian Foundation for Basic Research 18-43-543009

Abstract: The model RhOx/CeO2 systems were prepared by radio-frequency (RF) plasma sputtering of Rh electrode in O2 or Ar/O2 atmosphere. Thermal stability of the systems and their reaction probability towards CO oxidation were studied by X-ray photoelectron spectroscopy. It was shown that the small oxidized Rh nanoparticles on the CeO2 surface (RhOx/CeO2) obtained by RF sputtering in O2 have spectroscopic characteristics close to those of Rh3+ ions highly dispersed in ceria lattice. The RhOx/CeO2 system remains stable upon heating in vacuum at 450°C and shows reactivity towards CO oxidation at T > 200°C. RF sputtering in Ar/O2 atmosphere results in the formation of larger rhodium nanoparticles that are close to Rh2O3 oxide. The Rh2O3/CeO2 system demonstrates lower activity in CO oxidation and cannot be reduced at a temperature below 300°C. © 2020 John Wiley & Sons, Ltd.
Cite: Kibis L.S. , Krotova A.I. , Zaikovskii V.I. , Boronin A.I.
The Activity and Thermal Stability of RhOx/CeO2 Nanocomposites Prepared by Radio-Frequency Plasma Sputtering
Surface and Interface Analysis. 2020. V.52. N12. P.818-822. DOI: 10.1002/sia.6879 WOS Scopus РИНЦ AN OpenAlex
Dates:
Submitted: Oct 2, 2019
Accepted: Aug 19, 2020
Published online: Sep 28, 2020
Published print: Dec 1, 2020
Identifiers:
Web of science: WOS:000573007800001
Scopus: 2-s2.0-85091480879
Elibrary: 45264717
Chemical Abstracts: 2020:1929899
OpenAlex: W3089511761
Citing: Пока нет цитирований
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