Investigation of Charge Transfer Interaction in Heterometallic Precursors to Control Their Surface Reactivity for MOCVD of Pd-Cu Alloy Films Научная публикация
| Журнал |
Applied Surface Science
ISSN: 0169-4332 |
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| Вых. Данные | Год: 2021, Том: 547, Номер статьи : 149068, Страниц : 9 DOI: 10.1016/j.apsusc.2021.149068 | ||||
| Ключевые слова | Charge transfer interaction; Quantum chemical calculations; Surface reaction mechanism; Volatile heterometallic complexes; X-ray emission spectroscopy; X-ray photoelectron spectroscopy | ||||
| Авторы |
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| Организации |
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Информация о финансировании (1)
| 1 | Российский фонд фундаментальных исследований | 20-03-00629 (АААА-А20-120012890006-3) |
Реферат:
The work aims to study main factors determining surface reactions mechanism of the heterometallic MOCVD precursors for multicomponent inorganic films. A set of theoretical and experimental techniques is proposed to investigate the electronic structure of the copper-palladium precursor to control its surface reactivity in MOCVD of Pd-Cu alloy films. The surface and bulk charge distribution in the heterometallic precursors CuPdL4 (1) and Cu(hfa)2PdLF2 (2) and parent monometallic complexes was carried out using both experimental X-ray photoelectron (XPS) and X-ray emission (XES) spectroscopies and theoretical techniques (DFT calculations and NBO analysis). Comparison of calculated and experimental atomic charges for monometallic and heterometallic complexes revealed the electronic density redistribution on oxygen and metal atoms due to electronic charge transfer interaction between monometallic fragments in the heterocomplex, which was confirmed by NBO analysis. The charge transfer intensity appeared to be stronger for the fluorinated precursor 2, indicating its greater resistance to thermal dissociation into monometallic fragments compared to 1, which was confirmed by the data on the bimetallic films composition. Thus, the evidenced charge transfer interaction can be altered by changing the composition of the precursors to control their surface reactivity and films composition. © 2021 Elsevier B.V.
Библиографическая ссылка:
Krisyuk V.V.
, Kryuchkova N.A.
, Stadnichenko A.I.
, Syrokvashin M.M.
Investigation of Charge Transfer Interaction in Heterometallic Precursors to Control Their Surface Reactivity for MOCVD of Pd-Cu Alloy Films
Applied Surface Science. 2021. V.547. 149068 :1-9. DOI: 10.1016/j.apsusc.2021.149068 WOS Scopus РИНЦ CAPlus OpenAlex
Investigation of Charge Transfer Interaction in Heterometallic Precursors to Control Their Surface Reactivity for MOCVD of Pd-Cu Alloy Films
Applied Surface Science. 2021. V.547. 149068 :1-9. DOI: 10.1016/j.apsusc.2021.149068 WOS Scopus РИНЦ CAPlus OpenAlex
Даты:
| Поступила в редакцию: | 28 авг. 2020 г. |
| Принята к публикации: | 15 янв. 2021 г. |
| Опубликована online: | 19 янв. 2021 г. |
| Опубликована в печати: | 1 мая 2021 г. |
Идентификаторы БД:
| Web of science: | WOS:000634524400006 |
| Scopus: | 2-s2.0-85100381211 |
| РИНЦ: | 44958233 |
| Chemical Abstracts: | 2021:355473 |
| OpenAlex: | W3122593882 |