Optimization of Х-Ray Lithography Conditions for Fabrication of Large Arrays of High-Aspect-Ratio Submicron Pores | Sciact - CRIS-система Института катализа

Optimization of Х-Ray Lithography Conditions for Fabrication of Large Arrays of High-Aspect-Ratio Submicron Pores Научная публикация

Журнал

Journal of Micromechanics and Microengineering
ISSN: 0960-1317 , E-ISSN: 1361-6439

Вых. Данные

Год: 2021, Том: 31, Номер: 5, Номер статьи : 055011, Страниц : 10 DOI: 10.1088/1361-6439/abf331

Ключевые слова

Deposited radiation dose; Etching rate; Micropore array; Polyethylene terephthalate; Synchrotron radiation

Авторы

Nazmov V ^1,2 , Goldenberg B ¹ , Vasiliev A ³ , Asadchikov V ³

Организации

1	Budker Institute of Nuclear Physics, Siberian Branch of the Russian Academy of Science
2	Institute of Solid State Chemistry and Mechanochemistry, Siberian Branch of the Russian Academy of Sciences
3	Federal Research Centre ‘Crystallography and Photonics’, Russian Academy of Sciences

Patterning using a focused ionizing radiation beam provides a high spatial resolution but is not feasible when creating large arrays of microstructures. We propose the optimization of X-ray lithography parameters to create submicropores in a low-sensitivity material (polyethylene terephthalate) using a wide X-ray beam. This optimization results in the fabrication of regularly arranged micropores with a high aspect ratio (over 20) and diameters of up to 0.4 m across a large substrate area (up to several square centimeters)

Nazmov V. , Goldenberg B. , Vasiliev A. , Asadchikov V.
Optimization of Х-Ray Lithography Conditions for Fabrication of Large Arrays of High-Aspect-Ratio Submicron Pores
Journal of Micromechanics and Microengineering. 2021. V.31. N5. 055011 :1-10. DOI: 10.1088/1361-6439/abf331 WOS Scopus CAPlusCA OpenAlex

Поступила в редакцию:	8 окт. 2020 г.
Принята к публикации:	29 мар. 2021 г.
Опубликована online:	13 апр. 2021 г.
Опубликована в печати:	1 мая 2021 г.

Web of science:	WOS:000639947500001
Scopus:	2-s2.0-85105118131
Chemical Abstracts:	2021:1348203
Chemical Abstracts (print):	175:280701
OpenAlex:	W3144280668

БД	Цитирований
Web of science	5
Scopus	5
OpenAlex	8