Self-Aligned Single-Exposure Deep X-ray Lithography Научная публикация

Конференция	International Conference "Synchrotron and Free electron laser Radiation: generation and application" 13-17 июл. 2020 , Novosibirsk
Журнал	AIP Conference Proceedings ISSN: 0094-243X , E-ISSN: 1551-7616
Вых. Данные	Год: 2020, Том: 2299, Номер статьи : 060010, Страниц : 7 DOI: 10.1063/5.0030469
Авторы	Nazmov V.P. 1,2 , Goldenberg B.G. 1 , Reznikova E.F. 1 , Boerner M. 3
Организации	1 Budker Institute of Nuclear Physics of the Siberian Branch of the Russian Academy of Sciences 2 Institute of solid state chemistry and mechanochemistry of the Siberian Branch of the Russian Academy of Sciences 3 Karlsruhe Institute of Technology, Campus North, Institute of Microstructure Technology