N–Doping of Alumina Thin Film Support to Improve the Thermal Stability of Catalysts: Preparation and Investigation Full article
| Journal |
Applied Surface Science
ISSN: 0169-4332 |
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| Output data | Year: 2021, Volume: 566, Article number : 150631, Pages count : 7 DOI: 10.1016/j.apsusc.2021.150631 | ||
| Tags | N – doped catalyst support; Model alumina; XPS; STM | ||
| Authors |
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| Affiliations |
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Funding (1)
| 1 | Ministry of Science and Higher Education of the Russian Federation | 0239-2021-0002 |
Abstract:
This article presents the procedure for N – doping of alumina thin film grown on a metal substrate surface. The modification mechanism for model alumina by nitrogen during film formation is studied by in situ X-ray photoelectron spectroscopy (XPS) and scanning tunneling microscopy (STM). The preparation procedure, based on NO treatment of the growing alumina film, allows for nitrogen content control by NO pressure at a substrate temperature of 670 °C. The proposed N – doped model alumina support is suitable for catalysis oriented surface science studies devoted to enhancing supported metal particle resistance to thermal driven sintering.
Cite:
Dmitrachkov A.M.
, Kvon R.I.
, Nartova A.V.
N–Doping of Alumina Thin Film Support to Improve the Thermal Stability of Catalysts: Preparation and Investigation
Applied Surface Science. 2021. V.566. 150631 :1-7. DOI: 10.1016/j.apsusc.2021.150631 WOS Scopus РИНЦ AN OpenAlex
N–Doping of Alumina Thin Film Support to Improve the Thermal Stability of Catalysts: Preparation and Investigation
Applied Surface Science. 2021. V.566. 150631 :1-7. DOI: 10.1016/j.apsusc.2021.150631 WOS Scopus РИНЦ AN OpenAlex
Dates:
| Submitted: | May 13, 2021 |
| Accepted: | Jul 11, 2021 |
| Published online: | Jul 16, 2021 |
| Published print: | Nov 15, 2021 |
Identifiers:
| Web of science: | WOS:000691093600007 |
| Scopus: | 2-s2.0-85111343761 |
| Elibrary: | 46954334 |
| Chemical Abstracts: | 2021:1607658 |
| OpenAlex: | W3184545221 |