Structure, Mechanical and Tribological Properties of Ti-Doped and Cr-Doped a-C:H:SiOx Coatings Научная публикация
Журнал |
Vacuum
ISSN: 0042-207X |
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Вых. Данные | Год: 2024, Том: 219, Номер статьи : 112706, Страниц : 13 DOI: 10.1016/j.vacuum.2023.112706 | ||||||
Ключевые слова | a-C:H:SiOx coatings; Me-doped DLC; PACVD; Magnetron sputtering; Hardness; Wear resistance; Adhesive strength | ||||||
Авторы |
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Организации |
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Информация о финансировании (2)
1 | Министерство науки и высшего образования Российской Федерации (с 15 мая 2018) | 0239-2021-0003 |
2 | Министерство науки и высшего образования Российской Федерации (с 15 мая 2018) | FWRM-2021-0006 |
Реферат:
The work is devoted to the deposition of Ti- and Cr-doped a-C:H:SiOx coatings on WC-8Co substrates using plasma-assisted chemical vapor deposition and magnetron sputtering methods. The structure, surface morphology, mechanical and tribological properties of coatings are investigated depending on the Ti or Cr content. It is shown that only a small concentration of Ti or Cr in coatings improves their mechanical and tribological properties compared to undoped coatings. The addition of 0.8 at.% Ti to the a-C:H:SiOx coating reduces its wear rate by 3 times, and the addition of 3 at.% Cr to the a-C:H:SiOx coating reduces its friction coefficient by 30% and the wear rate by 10 times. According to VDI 3198 standard, the Ti- and Cr-doped a-C:H: SiOx coatings with a low concentration of metals have the adhesive strength quality HF1. At higher metal concentrations, the properties of the coatings deteriorate due to graphitization of the carbon structure.
Библиографическая ссылка:
Grenadyorov A.S.
, Solovyev А.А.
, Oskirko V.O.
, Oskomov K.V.
, Semenov V.A.
, Sypchenko V.S.
, Saraev A.A.
Structure, Mechanical and Tribological Properties of Ti-Doped and Cr-Doped a-C:H:SiOx Coatings
Vacuum. 2024. V.219. 112706 :1-13. DOI: 10.1016/j.vacuum.2023.112706 WOS Scopus РИНЦ CAPlus OpenAlex
Structure, Mechanical and Tribological Properties of Ti-Doped and Cr-Doped a-C:H:SiOx Coatings
Vacuum. 2024. V.219. 112706 :1-13. DOI: 10.1016/j.vacuum.2023.112706 WOS Scopus РИНЦ CAPlus OpenAlex
Даты:
Поступила в редакцию: | 20 июн. 2023 г. |
Принята к публикации: | 15 окт. 2023 г. |
Опубликована online: | 20 окт. 2023 г. |
Опубликована в печати: | 1 янв. 2024 г. |
Идентификаторы БД:
Web of science: | WOS:001102028500001 |
Scopus: | 2-s2.0-85174443693 |
РИНЦ: | 65725155 |
Chemical Abstracts: | 2023:2189808 |
OpenAlex: | W4387817497 |