MOCVD Growth and Study of Magnetic Co Films | Sciact - CRIS-system of Boreskov Institute of Catalysis

MOCVD Growth and Study of Magnetic Co Films Full article

Journal

Surface Engineering
ISSN: 0267-0844 , E-ISSN: 1743-2944

Output data

Year: 2016, Volume: 32, Number: 1, Pages: 8-14 Pages count : 7 DOI: 10.1179/1743294414Y.0000000424

Tags

Co films, Co precursor, Magnetic characteristics, MOCVD, Vapour pressure

Authors

Dorovskikh S.I. ¹ , Hairullin R.R. ^2,3 , Sysoev S.V. ¹ , Kriventsov V.V. ⁴ , Panin A.V. ² , Shubin Y.V. ^1,5 , Morozova N.B. ¹ , Gelfond N.V. ¹ , Korenev S.V. ^1,5

Affiliations

1	Nikolaev Institute of Inorganic Chemistry, Siberian Branch of Russian Academy of Sciences, aven. Lavrentiev 3, Novosibirsk 630090, Russia
2	Institute of Strength Physics and Materials Science, Siberian Branch of Russian Academy of Science, 2/1 Akademicheskii pr., Tomsk 634021, Russia
3	National Research Tomsk Polytechnic University, 30 Lenina av., Tomsk 634050, Russia
4	Boreskov Institute of Catalysis, Siberian Branch of Russian Academy ofSciences, aven. Lavrentiev 5, Novosibirsk 630090, Russia
5	Novosibirsk State University, Pirogova Str. 2, Novosibirsk 630090, Russia

Funding (1)

The Ministry of Education and Science of the Russian Federation

14.604.21.0080

The Co(N’acN’ac)2 complex, namely bis(2-methylamino-4-methyliminato-penten) cobalt(II), was for the first time used as a precursor for producing Co films via metal–organic chemical vapour deposition. This chelate exhibits good volatility ln (P/P°) = 26·45–14006·7/T(K) at moderate temperature values (382–427 K). Co films were grown on Si (100) substrates and studied by X-ray diffraction, extended X-ray absorption fine structure, atomic force and scanning electron microscopy, energy dispersive X-ray analysis and optical profilometry. Deposition conditions corresponding to the optimal electrical and magnetic characteristics of Co thin films are found.

Dorovskikh S.I. , Hairullin R.R. , Sysoev S.V. , Kriventsov V.V. , Panin A.V. , Shubin Y.V. , Morozova N.B. , Gelfond N.V. , Korenev S.V.
MOCVD Growth and Study of Magnetic Co Films
Surface Engineering. 2016. V.32. N1. P.8-14. DOI: 10.1179/1743294414Y.0000000424 WOS Scopus РИНЦ AN OpenAlex

Submitted:	Aug 14, 2014
Accepted:	Nov 13, 2014
Published online:	Nov 27, 2014
Published print:	Jan 2, 2016

Web of science:	WOS:000369429900002
Scopus:	2-s2.0-84959360718
Elibrary:	26972024
Chemical Abstracts:	2016:166647
OpenAlex:	W2007808179

DB	Citing
Web of science	4
Scopus	4
Elibrary	3
OpenAlex	7