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Modern Possibilities of Vapour Chambers and other Intensive Cooling Techniques. Comparative Review Научная публикация

Журнал E3S Web of Conferences
, E-ISSN: 2267-1242
Вых. Данные Год: 2023, Том: 459, Номер статьи : 08007, Страниц : 7 DOI: 10.1051/e3sconf/202345908007
Авторы Pukhovoy Maxim V. 1,2 , Bykovskaya Elena F. 1 , Kabov Oleg A. 1
Организации
1 Kutateladze Institute of Thermophysics SB RAS, Lavrentiev Ave., 2, Novosibirsk, 630090, Russia
2 Siberian Circular Photon Source "SKlF", Morskoy Ave., 2, Novosibirsk, 630090, Russia

Информация о финансировании (2)

1 Министерство науки и высшего образования Российской Федерации (с 15 мая 2018) FWNS-2021-0003 (121031800213-0)(075-00383-21-00)
2 Министерство науки и высшего образования Российской Федерации (с 15 мая 2018) FWUR-2023-0001

Реферат: Due to their high reliability, ease of manufacture, passive operation, and efficient heat transfer, vapor chambers (VC) are widely used for temperature management of modern electronic and power devices. This review considers all experimental works on the characterization of the thermal characteristics of VC, in the results of which the threshold in the removal of a specific heat flux of >0.1 kW/cm2 was overcome. This literature review, when compared with other cooling techniques, showed that they have not shown a noticeable increase in recent decades. Moreover, we should expect a qualitative increase in the capabilities of the VC and the expansion of their use. The principles of operation of modern VCs, often referred to as evaporation chambers, are also conceptually described
Библиографическая ссылка: Pukhovoy M.V. , Bykovskaya E.F. , Kabov O.A.
Modern Possibilities of Vapour Chambers and other Intensive Cooling Techniques. Comparative Review
E3S Web of Conferences. 2023. V.459. 08007 :1-7. DOI: 10.1051/e3sconf/202345908007 Scopus OpenAlex СКИФ ID
Даты:
Поступила в редакцию: 20 июл. 2023 г.
Опубликована в печати: 6 дек. 2023 г.
Идентификаторы БД:
Scopus: 2-s2.0-85182761331
OpenAlex: W4389384567
СКИФ ID: 3721
Цитирование в БД: Пока нет цитирований
Альметрики: