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Chemically Prepared Tellurium Layer on PbSnTe Films: Passivation and Oxidation Properties Full article

Journal Surfaces and Interfaces
ISSN: 2468-0230
Output data Year: 2025, Volume: 71, Article number : 106887, Pages count : 8 DOI: 10.1016/j.surfin.2025.106887
Tags Chalcogenides, Tellurium cap layer, Oxidation, ARPES, XPS, Ellipsometry
Authors Akhundov Igor O. 1 , Ishchenko Denis V. 1 , Fedosenko Evgeniy V. 1 , Golyashov Vladimir A. 1,2 , Shvets Vasily A. 1 , Suprun Sergey P. 1 , Kyrova Ekaterina D. 1,4 , Mikaeva Anastasiya S. 1,3 , Tereshchenko Oleg E. 1,2,3
Affiliations
1 Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, 630090 Novosibirsk, Russia
2 Synchrotron Radiation Facility SKIF, Boreskov Institute of Catalysis, Siberian Branch, Russian Academy of Sciences, Koltsovo 630559, Russia
3 Novosibirsk State University, 630090, Novosibirsk, Russia
4 Novosibirsk State Technical University, 630073, Novosibirsk, Russia

Abstract: Preparation of atomically clean surfaces of lead and tin chalcogenides is an important task for the development of lasers, photodetectors, thermoelectric elements, as well as a prerequisite for the study of electronic properties of the surface, including the properties of topological insulators. We proposed an alternative way to passivate the PbSnTe surface by creating a 3 nm thick tellurium layer by wet chemical treatment and investigated the oxidation process of the Te-capped PbSnTe film by X-ray photoelectron spectroscopy and ellipsometry. Twostage oxidation with the initial formation of tin oxide and a subsequent formation of lead and tellurium oxides confirmed the mechanism of oxygen diffusion through the tellurium layer with the diffusion coefficient equal to 2⋅10–17 cm2s-1. The protection time of the 3 nm thick tellurium layer was >5 min, allowing samples to be loaded without the use of an inert gas glove box. In addition, further vacuum annealing yields an atomically clean and structurally ordered (111) PbSnTe surface, which makes it possible to study the surface electronic structure by ARPES.
Cite: Akhundov I.O. , Ishchenko D.V. , Fedosenko E.V. , Golyashov V.A. , Shvets V.A. , Suprun S.P. , Kyrova E.D. , Mikaeva A.S. , Tereshchenko O.E.
Chemically Prepared Tellurium Layer on PbSnTe Films: Passivation and Oxidation Properties
Surfaces and Interfaces. 2025. V.71. 106887 :1-8. DOI: 10.1016/j.surfin.2025.106887 publication_identifier_short.sciact_skif_identifier_type
Dates:
Submitted: Feb 8, 2025
Accepted: Jun 4, 2025
Published online: Jun 9, 2025
Published print: Aug 15, 2025
Identifiers:
publication_identifier.sciact_skif_identifier_type: 3947
Citing: Пока нет цитирований
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