Enhanced Reflectance X-Ray Absorption Fine Structure Sensitivity Using a Whispering-Gallery Waveguide | Sciact - CRIS-system of Boreskov Institute of Catalysis

Enhanced Reflectance X-Ray Absorption Fine Structure Sensitivity Using a Whispering-Gallery Waveguide Full article

Conference

XII National Synchrotron Radiation Conference
13-18 Jul 1998 , Новосибирск

Journal

Nuclear Instruments and Methods in Physics Research Section A
ISSN: 0168-9002

Output data

Year: 2000, Volume: 448, Number: 1-2, Pages: 173-178 Pages count : 6 DOI: 10.1016/S0168-9002(00)00216-3

Tags

Light absorption; Mirrors; Molecules; Monolayers; Ray tracing; Reflection; Semiconducting germanium compounds; Silicon wafers; Ultrathin films; Waveguides; X rays

Authors

Chernov V.A. ^1,2 , Kim S.K. ³ , Kovalenko N.V. ⁴ , Zolotarev K.V. ^4,5

Affiliations

1	Siberian SR Center at Budker INP, Institute of Nuclear Physics, 11 Lavrentyev Avenue, 630090 Novosibirsk, Russia
2	Boreskov Institute of Catalysis, 630090 Novosibirsk, Russia
3	Materials Science Division, Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720, USA
4	Budker Institute of Nuclear Physics, 630090 Novosibirsk, Russia
5	New Industry Research Organization, 1-5-2, Minatojima-minamimachi, Chuo-ku, Kobe 650-0047, Japan

Funding (1)

Russian Foundation for Basic Research

97-02-18454

A new technique of reflectance X-ray absorption fine structure (REFL-XAFS) utilizing waveguides where X-rays are reflected many times along the waveguide surface is discussed. The multiple total reflection (MTR) phenomenon highly increases X-ray interaction with the waveguide surface and hence offers higher sensitivity compared to conventional (single reflection) REFL-XAFS. On the one hand, this technique is a direct structural method for characterizing waveguides (e.g. capillaries) where the application of other methods is very difficult. On the other hand, the conventional thin wafer can be transformed to a whispering-gallery (WG) waveguide by bending to a curved mirror. Ray tracing calculations demonstrate that the WG waveguide is very suitable for REFL-XAFS measurements. This method was experimentally realized for a cylindrically bent silica wafer with the surface covered with a GeO2 monolayer. The Ge K-edge REFL-XAFS measurements were performed using both MTR and conventional techniques. The MTR technique allows us to achieve about 20-fold gain in the signal-to-background ratio compared with the conventional technique. The MTR phenomenon discussed in this paper can provide new possibilities to study clean surfaces, ultrathin films and adsorbed molecules.

Chernov V.A. , Kim S.K. , Kovalenko N.V. , Zolotarev K.V.
Enhanced Reflectance X-Ray Absorption Fine Structure Sensitivity Using a Whispering-Gallery Waveguide
Nuclear Instruments and Methods in Physics Research Section A. 2000. V.448. N1-2. P.173-178. DOI: 10.1016/S0168-9002(00)00216-3 WOS Scopus РИНЦ ANCAN OpenAlex

Published print:	Jun 21, 2000
Published online:	Jun 22, 2000

Web of science:	WOS:000088282500037
Scopus:	2-s2.0-0034205490
Elibrary:	13345358
Chemical Abstracts:	2000:434611
Chemical Abstracts (print):	133:184996
OpenAlex:	W2066601862

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Web of science	1
Scopus	2
Elibrary	2
OpenAlex	1