Abstract: Microdevices are usually made up of several interacting components that can be assembled on the basis of 3-dimensional LIGA structures, using various techniques to fulfill the required positioning accuracy - the so-called combined LIGA technology [1]. As a part of the LIGA technology, deep X-ray lithography enables the formation of 3-D microstructures of significant size in each of the three dimensions; however, it is often possible to improve positioning accuracy by using self-alignment technique when patterning with the use of X-ray mask, as shown in [2]. In our work, we consider single-exposure with self-alignment technique for the creation of microdevices of technological material, which can demonstrate new physical capabilities

Cite: Nazmov V.P. , Goldenberg B.G. , Reznikova E.F.
Self-Aligned Single Exposure Deep X-ray Lithography
International Conference "Synchrotron and Free electron laser Radiation: generation and application" 13-17 Jul 2020