Abstract: The design and method of manufacturing high-contrast LIGA masks for deep X-ray lithography in the spectral range 0.5÷3Å are described. Gold was used as the material of the masking layer. Creation of this layer on the surface of the silicon plate was carried out by electro forming through a resistive mask. The bearing membrane and the support ring of the X-mask were formed by removing the central part of the plate by ion-beam etching it from the back side. Testing the quality and contrast of the finished LIGA masks was done at the X-ray microscopy station VEPP-3.

Cite: Gentselev A.N. , Goldenberg B.G. , Kuper K.E. , Dulʹtsev F.N.
Fabrication of Silicon LIGA Masks
The International Conference "Synchrotron and Free electron laser Radiation: generation and application" 25-28 Jun 2018