Реферат: The design and manufacturing method of x-ray masks, which have high-contrast in x-ray spectral range of shorter wavelengths (λ ≈ 3÷7 Å), are described. This masks can be a tool to form a resistive mask with a thickness of ~20÷150 microns and also can be used as intermediate mask for the fabrication of LIGA-masks for deep X-ray lithography. The manufacturing method is based on silicon planar technology. Two types of masks were made with mainly aluminum membrane. The method ensures the manufacture of x-ray masks with multilayer (titanium, aluminum and silicon layers, the thickness of which can vary in a fairly wide range) bearing membranes.

Библиографическая ссылка: Gentselev A.N. , Goldenberg B.G. , Lemzyakov A.A. , Dulʹtsev F.N. , Gelʹfand A.V.
Fabrication X-ray Masks with Multilayer Bearing Membranes
The International Conference "Synchrotron and Free electron laser Radiation: generation and application" 25-28 Jun 2018