Synchrotron Radiation Induced Photo Etching of Cesium Iodide - Доклады на конференциях | Sciact - CRIS-система Института катализа

Synchrotron Radiation Induced Photo Etching of Cesium Iodide Доклады на конференциях

Язык

Английский

Тип доклада

Стендовый

Url доклада

https://indico.inp.nsk.su/event/12/contributions/486/

Конференция

The International Conference "Synchrotron and Free electron laser Radiation: generation and application"
25-28 июн. 2018 , Novosibirsk

Авторы

Лемзяков Алексей Георгиевич ¹ , Лях Владимир Васильевич ¹ , Гольденберг Борис Григорьевич ¹ , Козырев Евгений Анатольевич ¹ , Назьмов Владимир Петрович ¹

Организации

1	Институт ядерной физики имени Г.И. Будкера СО РАН

Synchrotron radiation induced photo etching of cesium iodide (CsI) was investigated. The model for photo etching was proposed and compared with experimental data. Dependence of the etching rate on the SR spectrum and on the substrate temperature were revealed. We estimate possibility of manufacturing of high aspect ratio microstructures of CsI scintillation material. The work was done using the infrastructure of the Shared-Use Center “Siberian Synchrotron and Terahertz Radiation Center (SSTRC)” based on VEPP-3 of BINP SB RAS (Novosibirsk, Russian Federation).

Lemzyakov A.A. , Lyakh V.V. , Goldenberg B.G. , Kozyrev E.A. , Nazmov V.P.
Synchrotron Radiation Induced Photo Etching of Cesium Iodide
The International Conference "Synchrotron and Free electron laser Radiation: generation and application" 25-28 Jun 2018