Nanoscale Potential Fluctuation in Non-Stoichiometric Hafnium Suboxides Тезисы доклада
Конференция |
228th Fall Meeting of Electrochemical Society (ECS 2015 Phoenix) 11-15 окт. 2015 , Phoenix |
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Журнал |
ECS Meeting Abstracts
ISSN: 2151-2043 |
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Вых. Данные | Год: 2015, Том: MA2015-02, Номер: 18, Номер статьи : 838, Страниц : DOI: 10.1149/ma2015-02/18/838 | ||||||||
Авторы |
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Организации |
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Реферат:
We study the structure of nonstoichiometric HfOx films with variable composition using methods of X-ray photoelectron spectroscopy and spectroscopic ellipsometry. HfOx, to a first approximation, is a mixture of HfO2 and Hf metal with a small amount (~10–15%) of hafnium sub-oxide HfOy (y<2).
Библиографическая ссылка:
Orlov O.M.
, Krasnikov G.J.
, Gritsenko V.A.
, Kruchinin V.N.
, Perevalov T.V.
, Aliev V.S.
, Islamov D.R.
, Prosvirin I.P.
Nanoscale Potential Fluctuation in Non-Stoichiometric Hafnium Suboxides
ECS Meeting Abstracts. 2015. V.MA2015-02. N18. 838 . DOI: 10.1149/ma2015-02/18/838
Nanoscale Potential Fluctuation in Non-Stoichiometric Hafnium Suboxides
ECS Meeting Abstracts. 2015. V.MA2015-02. N18. 838 . DOI: 10.1149/ma2015-02/18/838
Идентификаторы БД:
OpenAlex | W4236171981 |
Цитирование в БД:
Пока нет цитирований