Formation and Decomposition of Thin Rhodium Oxide Films Full article
| Journal |
Reaction Kinetics and Catalysis Letters
ISSN: 0133-1736 , E-ISSN: 1588-2837 |
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| Output data | Year: 1993, Volume: 49, Number: 1, Pages: 29-37 Pages count : 9 DOI: 10.1007/BF02084025 | ||
| Tags | Spectroscopy; Catalysis; Surface Layer; Electron Transfer; Decomposition; Desorption; Film growth; Films; Oxides | ||
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Abstract:
Interaction of O2 with Rh (poly) and Rh (100) has been studied by Auger Electron Spectroscopy and thermal desorption method at O2 pressures of 10−5 – 103 Pa and at 400–1600 K. At P(O2)<10−5 Pa chemisorption of O2 occurs, at
P(O2)=10−5 – 10−1 Pa surface oxides are formed, at P(O2)>1.0 Pa a bulk Rh2O3 oxide starts to grow. The growth of rhodium oxide film proceeds via the Cabrera-Mott mechanism. Its decomposition occurs via a mechanism including electron transfer across the oxide film, O2 desorption from the surface layer and rearrangement of the oxide layer.
Cite:
Salanov A.N.
, Savchenko V.I.
Formation and Decomposition of Thin Rhodium Oxide Films
Reaction Kinetics and Catalysis Letters. 1993. V.49. N1. P.29-37. DOI: 10.1007/BF02084025 WOS Scopus РИНЦ ANCAN OpenAlex
Formation and Decomposition of Thin Rhodium Oxide Films
Reaction Kinetics and Catalysis Letters. 1993. V.49. N1. P.29-37. DOI: 10.1007/BF02084025 WOS Scopus РИНЦ ANCAN OpenAlex
Dates:
| Submitted: | Oct 23, 1992 |
| Accepted: | Jan 4, 1993 |
| Published print: | Apr 1, 1993 |
Identifiers:
| Web of science: | WOS:A1993LN63100005 |
| Scopus: | 2-s2.0-0027574814 |
| Elibrary: | 31146926 |
| Chemical Abstracts: | 1993:634953 |
| Chemical Abstracts (print): | 119:234953 |
| OpenAlex: | W2055624960 |