Optimization of Х-Ray Lithography Conditions for Fabrication of Large Arrays of High-Aspect-Ratio Submicron Pores Full article
| Journal |
Journal of Micromechanics and Microengineering
ISSN: 0960-1317 , E-ISSN: 1361-6439 |
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| Output data | Year: 2021, Volume: 31, Number: 5, Article number : 055011, Pages count : 10 DOI: 10.1088/1361-6439/abf331 | ||||||
| Tags | Deposited radiation dose; Etching rate; Micropore array; Polyethylene terephthalate; Synchrotron radiation | ||||||
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Abstract:
Patterning using a focused ionizing radiation beam provides a high spatial resolution but is not feasible when creating large arrays of microstructures. We propose the optimization of X-ray lithography parameters to create submicropores in a low-sensitivity material (polyethylene terephthalate) using a wide X-ray beam. This optimization results in the fabrication of regularly arranged micropores with a high aspect ratio (over 20) and diameters of up to 0.4 m across a large substrate area (up to several square centimeters)
Cite:
Nazmov V.
, Goldenberg B.
, Vasiliev A.
, Asadchikov V.
Optimization of Х-Ray Lithography Conditions for Fabrication of Large Arrays of High-Aspect-Ratio Submicron Pores
Journal of Micromechanics and Microengineering. 2021. V.31. N5. 055011 :1-10. DOI: 10.1088/1361-6439/abf331 WOS Scopus ANCAN OpenAlex
Optimization of Х-Ray Lithography Conditions for Fabrication of Large Arrays of High-Aspect-Ratio Submicron Pores
Journal of Micromechanics and Microengineering. 2021. V.31. N5. 055011 :1-10. DOI: 10.1088/1361-6439/abf331 WOS Scopus ANCAN OpenAlex
Dates:
| Submitted: | Oct 8, 2020 |
| Accepted: | Mar 29, 2021 |
| Published online: | Apr 13, 2021 |
| Published print: | May 1, 2021 |
Identifiers:
| Web of science: | WOS:000639947500001 |
| Scopus: | 2-s2.0-85105118131 |
| Chemical Abstracts: | 2021:1348203 |
| Chemical Abstracts (print): | 175:280701 |
| OpenAlex: | W3144280668 |