Self-Aligned Single-Exposure Deep X-ray Lithography | Sciact - CRIS-system of Boreskov Institute of Catalysis

Self-Aligned Single-Exposure Deep X-ray Lithography Full article

Conference

International Conference "Synchrotron and Free electron laser Radiation: generation and application"
13-17 Jul 2020 , Novosibirsk

Journal

AIP Conference Proceedings
ISSN: 0094-243X , E-ISSN: 1551-7616

Output data

Year: 2020, Volume: 2299, Article number : 060010, Pages count : 7 DOI: 10.1063/5.0030469

Authors

Nazmov V.P. ^1,2 , Goldenberg B.G. ¹ , Reznikova E.F. ¹ , Boerner M. ³

Affiliations

1	Budker Institute of Nuclear Physics of the Siberian Branch of the Russian Academy of Sciences
2	Institute of solid state chemistry and mechanochemistry of the Siberian Branch of the Russian Academy of Sciences
3	Karlsruhe Institute of Technology, Campus North, Institute of Microstructure Technology

The method of deep X-ray lithography has been developed, which allows the formation of self-aligned microstructures. Examples of microstructures are presented. © 2020 American Institute of Physics Inc. All rights reserved.

Nazmov V.P. , Goldenberg B.G. , Reznikova E.F. , Boerner M.
Self-Aligned Single-Exposure Deep X-ray Lithography

AIP Conference Proceedings. 2020. V.2299. 060010 :1-7. DOI: 10.1063/5.0030469 Scopus РИНЦ AN OpenAlex

Full text from publisher

Published online:

Nov 17, 2020

Scopus:	2-s2.0-85096495955
Elibrary:	45130388
Chemical Abstracts:	2021:1075021
OpenAlex:	W3106061492

DB	Citing
Scopus	3
OpenAlex	3