Characterization of Structure, Morphology, Optical and Electrical Properties of AlN–Al–V Multilayer Thin Films Fabricated by Reactive DC Magnetron Sputtering | Sciact - CRIS-system of Boreskov Institute of Catalysis

Characterization of Structure, Morphology, Optical and Electrical Properties of AlN–Al–V Multilayer Thin Films Fabricated by Reactive DC Magnetron Sputtering Full article

Journal

Coatings
ISSN: 2079-6412

Output data

Year: 2023, Volume: 13, Number: 2, Article number : 223, Pages count : 22 DOI: 10.3390/coatings13020223

Tags

thin film; hexagonal AlN; composite AlN–Al–V; DC magnetron sputtering; structural characterization; piezoelectric effect

Authors

Mironova Maria I. ¹ , Kapishnikov Aleksandr V. ^1,2 , Hamoud Ghaithaa A. ¹ , Volodin Vladimir A. ^1,3 , Azarov Ivan A. ^1,3 , Yushkov Ivan D. ^1,3 , Kamaev Gennadiy N. ³ , Suprun Evgeny A. ² , Chirikov Nikita A. ⁴ , Davletkildeev Nadim A. ^4,5 , Baidakov Alexey N. ⁴ , Kovivchak Vladimir S. ^4,5 , Baranova Larisa V. ^4,5 , Strunin Vladimir I. ^4,5 , Geydt Pavel V. ^1,3

Affiliations

1	Laboratory of Functional Diagnostics of Low–Dimensional Structures for Nanoelectronics, Novosibirsk State University, Pirogova Str. 2, 630090 Novosibirsk, Russia
2	Federal Research Center Boreskov Institute of Catalysis, Siberian Branch of the Russian Academy of Sciences, Prospect Lavrentieva, 5, 630090 Novosibirsk, Russia
3	Rzhanov Institute of Semiconductor Physics, Siberian Branch of the Russian Academy of Sciences, Lavrentyev Ave. 13, 630090 Novosibirsk, Russia
4	Institute of Radiophysics and Physical Electronics, Omsk Scientific Center, Siberian Branch, Russian Academy of Sciences, 644024 Omsk, Russia
5	Department of General and Experimental Physics, Dostoevsky Omsk State University, 644077 Omsk, Russia

Funding (3)

1	Ministry of Science and Higher Education of the Russian Federation	FSUS-2020-0029
2	Ministry of Science and Higher Education of the Russian Federation	075-12-2021-697
3	Ministry of Science and Higher Education of the Russian Federation	075-00611-21-01 (121121700062-3) (FWEE-2021-0005)

Composite thin films of the AlN–Al–V type, grown by magnetron sputtering, were analyzed by several complementary diagnostic methods. The power of the magnetron was used as a variable parameter, while gas flows, chamber pressure, and substrate temperature remained unchanged during the film fabrication. According to grazing incidence X-ray diffraction (GIXRD) results, in most cases, it was possible to obtain an (002)-oriented aluminum nitride (AlN) layer in the films, although, with an increase in the magnetron power to 800 W, the formation of X-ray amorphous AlN was observed. Similarly, according to the Raman results, the width of the peak of the vibrational mode E1, which characterizes the correlation length of optical phonons, also significantly increased in the case of the sample obtained at 800 W, which may indicate a deterioration in the crystallinity of the film. A study of the surface morphology by atomic force microscopy (AFM) and scanning electron microscopy (SEM) showed that the AlN film grows in the form of vertically oriented hexagons, and crystallites emerge on the surface in the form of dendritic structures. During the analysis of the AFM roughness power spectral density (PSD-x) functions, it was found that the type of substrate material does not significantly affect the surface roughness of the AlN films. According to the energy–dispersive X-ray spectroscopy (SEM-EDS) elemental analysis, an excess of aluminum was observed in all fabricated samples. The study of the current-voltage characteristics of the films showed that the resistance of aluminum nitride layers in such composites correlates with both the aluminum content and the structural imperfection of crystallites.

Mironova M.I. , Kapishnikov A.V. , Hamoud G.A. , Volodin V.A. , Azarov I.A. , Yushkov I.D. , Kamaev G.N. , Suprun E.A. , Chirikov N.A. , Davletkildeev N.A. , Baidakov A.N. , Kovivchak V.S. , Baranova L.V. , Strunin V.I. , Geydt P.V.
Characterization of Structure, Morphology, Optical and Electrical Properties of AlN–Al–V Multilayer Thin Films Fabricated by Reactive DC Magnetron Sputtering
Coatings. 2023. V.13. N2. 223 :1-22. DOI: 10.3390/coatings13020223 WOS Scopus РИНЦ ANCAN OpenAlex

Submitted:	Dec 31, 2022
Accepted:	Jan 17, 2023
Published online:	Jan 18, 2023
Published print:	Feb 1, 2023

Web of science:	WOS:000938951700001
Scopus:	2-s2.0-85149064927
Elibrary:	54893901
Chemical Abstracts:	2023:431742
Chemical Abstracts (print):	183:318401
OpenAlex:	W4317425571

DB	Citing
Scopus	3
Web of science	2
OpenAlex	3
Elibrary	3