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Effect of the Nanorough Surface of TiO2 Thin Films on the Compatibility with Endothelial Cells Full article

Journal International Journal of Molecular Sciences
ISSN: 1422-0067 , E-ISSN: 1661-6596
Output data Year: 2023, Volume: 24, Number: 7, Article number : 6699, Pages count : 19 DOI: 10.3390/ijms24076699
Tags titanium oxide, titanium oxynitride, thin films, nanoroughness, cytocompatibility, reactive magnetron sputtering
Authors Zhuravleva Irina Yu. 1 , Surovtseva Maria A. 1,2 , Vaver Andrey A. 1 , Suprun Evgeny A. 3 , Kim Irina I. 1,2 , Bondarenko Natalia A. 1,2 , Kuzmin Oleg S. 4,5 , Mayorov Alexander P. 6 , Poveshchenko Olga V. 1,2
Affiliations
1 E. Meshalkin National Medical Research Center, RF Ministry of Health, 15 Rechkunovskaya St.,630055 Novosibirsk, Russia
2 Research Institute of Clinical and Experimental Lymphology, Branch of the Federal Research Center Institute of Cytology and Genetics SB RAS, 2 Timakova St., 630060 Novosibirsk, Russia
3 Boreskov Institute of Catalysis SB RAS, Lavrentiev Ave. 5, 630090 Novosibirsk, Russia
4 Institute of Strength Physics and Materials Science, Siberian Branch Russian Academy of Sciences, 2/4, pr. Akademicheskii, 634055 Tomsk, Russia 5 VIP Technologies Ltd., 634055 Tomsk, Russia
5 VIP Technologies Ltd., 634055 Tomsk, Russia
6 Institute of Laser Physics of Siberian Branch, Russian Academy of Sciences, 15B Lavrentiev Av., 630090 Novosibirsk, Russia

Funding (2)

1 Ministry of Health of the Russian Federation 056-00125-21-00 AVRB-2021-0001 (121032300337-5)
2 Ministry of Science and Higher Education of the Russian Federation 075-00707-2200 (122022800132-1) (FWNR-2022-0009)

Abstract: The cytocompatibility of titanium oxides (TiO2) and oxynitrides (N-TiO2, TiOxNy) thin films depends heavily on the surface topography. Considering that the initial relief of the substrate and the coating are summed up in the final topography of the surface, it can be expected that the same sputtering modes result in different surface topography if the substrate differs. Here, we investigated the problem by examining 16 groups of samples differing in surface topography; 8 of them were hand-abraded and 8 were machine-polished. Magnetron sputtering was performed in a reaction gas medium with various N2:O2 ratios and bias voltages. Abraded and polished uncoated samples served as controls. The surfaces were studied using atomic force microscopy (AFM). The cytocompatibility of coatings was evaluated in terms of cytotoxicity, adhesion, viability, and NO production. It has been shown that the cytocompatibility of thin films largely depends on the surface nanostructure. Both excessively low and excessively high density of peaks, high and low kurtosis of height distribution (Sku), and low rates of mean summit curvature (Ssc) have a negative effect. Optimal cytocompatibility was demonstrated by abraded surface with a TiOxNy thin film sputtered at N2:O2 = 1:1 and Ub = 0 V. The nanopeaks of this surface had a maximum height, a density of about 0.5 per 1 µm2, Sku from 4 to 5, and an Ssc greater than 0.6. We believe that the excessive sharpness of surface nanostructures formed during magnetron sputtering of TiO2 and N-TiO2 films, especially at a high density of these structures, prevents both adhesion of endothelial cells, and their further proliferation and functioning. This effect is apparently due to damage to the cell membrane. At low height, kurtosis, and peak density, the main factor affecting the cell/surface interface is inefficient cell adhesion.
Cite: Zhuravleva I.Y. , Surovtseva M.A. , Vaver A.A. , Suprun E.A. , Kim I.I. , Bondarenko N.A. , Kuzmin O.S. , Mayorov A.P. , Poveshchenko O.V.
Effect of the Nanorough Surface of TiO2 Thin Films on the Compatibility with Endothelial Cells
International Journal of Molecular Sciences. 2023. V.24. N7. 6699 :1-19. DOI: 10.3390/ijms24076699 WOS Scopus РИНЦ AN PMID OpenAlex
Dates:
Submitted: Feb 28, 2023
Accepted: Mar 30, 2023
Published print: Apr 3, 2023
Published online: Apr 3, 2023
Identifiers:
Web of science: WOS:000970294700001
Scopus: 2-s2.0-85152336913
Elibrary: 50458681
Chemical Abstracts: 2023:810322
PMID: 37047671
OpenAlex: W4362559879
Citing:
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Elibrary 1
Scopus 1
Web of science 1
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