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Modern Possibilities of Vapour Chambers and other Intensive Cooling Techniques. Comparative Review Full article

Journal E3S Web of Conferences
, E-ISSN: 2267-1242
Output data Year: 2023, Volume: 459, Article number : 08007, Pages count : 7 DOI: 10.1051/e3sconf/202345908007
Authors Pukhovoy Maxim V. 1,2 , Bykovskaya Elena F. 1 , Kabov Oleg A. 1
Affiliations
1 Kutateladze Institute of Thermophysics SB RAS, Lavrentiev Ave., 2, Novosibirsk, 630090, Russia
2 Siberian Circular Photon Source "SKlF", Morskoy Ave., 2, Novosibirsk, 630090, Russia

Funding (2)

1 Ministry of Science and Higher Education of the Russian Federation FWNS-2021-0003 (121031800213-0)(075-00383-21-00)
2 Ministry of Science and Higher Education of the Russian Federation FWUR-2023-0001

Abstract: Due to their high reliability, ease of manufacture, passive operation, and efficient heat transfer, vapor chambers (VC) are widely used for temperature management of modern electronic and power devices. This review considers all experimental works on the characterization of the thermal characteristics of VC, in the results of which the threshold in the removal of a specific heat flux of >0.1 kW/cm2 was overcome. This literature review, when compared with other cooling techniques, showed that they have not shown a noticeable increase in recent decades. Moreover, we should expect a qualitative increase in the capabilities of the VC and the expansion of their use. The principles of operation of modern VCs, often referred to as evaporation chambers, are also conceptually described
Cite: Pukhovoy M.V. , Bykovskaya E.F. , Kabov O.A.
Modern Possibilities of Vapour Chambers and other Intensive Cooling Techniques. Comparative Review
E3S Web of Conferences. 2023. V.459. 08007 :1-7. DOI: 10.1051/e3sconf/202345908007 Scopus OpenAlex publication_identifier_short.sciact_skif_identifier_type
Dates:
Submitted: Jul 20, 2023
Published print: Dec 6, 2023
Identifiers:
Scopus: 2-s2.0-85182761331
OpenAlex: W4389384567
publication_identifier.sciact_skif_identifier_type: 3721
Citing: Пока нет цитирований
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