Composition and Structure of Films Deposited from Silyl Derivatives of Asymmetrical Dimethylhydrazine Full article
Journal |
Inorganic Materials
ISSN: 0020-1685 , E-ISSN: 1608-3172 |
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Output data | Year: 2003, Volume: 39, Number: 2, Pages: 117-122 Pages count : 6 DOI: 10.1023/A:1022186310997 | ||||
Tags | Chemical Vapor Deposition; Crystalline Phase; Film Surface; Crystallization Process; Optical Spectroscopy | ||||
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Abstract:
Si–N–C films were produced by remote-plasma chemical vapor deposition using silyl derivatives of asymmetrical dimethylhydrazine as precursors and were characterized by optical spectroscopy, x-ray photoelectron spectroscopy, scanning electron microscopy, and synchrotron x-ray diffraction. The results demonstrate that Si–N and Si–C bonds prevail in the films deposited using excited hydrogen, while the structure of the films deposited using excited helium is dominated by Si–N and C–N bonds. The films contain both amorphous and crystalline silicon carbonitride. The crystalline phase can be indexed in a tetragonal cell with lattice parameters a= 9.6 Å and c= 6.4 Å. The formation of the crystalline phase and the shape of the crystallites are not correlated with the deposition temperature, which gives grounds to believe that the crystallization process may occur in the gas phase or on the film surface as a result of the increase in mechanical stress with increasing film thickness.
Cite:
Smirnova T.P.
, Badalyan A.M.
, Yakovkina L.V.
, Shmakov A.N.
, Asanov I.P.
, Borisov V.O.
Composition and Structure of Films Deposited from Silyl Derivatives of Asymmetrical Dimethylhydrazine
Inorganic Materials. 2003. V.39. N2. P.117-122. DOI: 10.1023/A:1022186310997 WOS Scopus РИНЦ
Composition and Structure of Films Deposited from Silyl Derivatives of Asymmetrical Dimethylhydrazine
Inorganic Materials. 2003. V.39. N2. P.117-122. DOI: 10.1023/A:1022186310997 WOS Scopus РИНЦ
Original:
Смирнова Т.П.
, Бадалян А.М.
, Яковкина Л.В.
, Шмаков А.Н.
, Асанов И.П.
, Борисов В.О.
Состав и структура пленок, синтезированных из силильных производных несимметричного диметилгидразина
Неорганические материалы. 2003. Т.39. №2. С.163-169. РИНЦ
Состав и структура пленок, синтезированных из силильных производных несимметричного диметилгидразина
Неорганические материалы. 2003. Т.39. №2. С.163-169. РИНЦ
Dates:
Submitted: | Mar 25, 2002 |
Published print: | Feb 1, 2003 |
Identifiers:
Web of science | WOS:000181224800007 |
Scopus | 2-s2.0-3543022114 |
Elibrary | 13434654 |
Chemical Abstracts | 2003:75235 |
Chemical Abstracts (print) | 138:393203 |
OpenAlex | W118871724 |