Electrodeposited Non-Stoichiometric Tungstic Acid for Electrochromic Applications: Film Growth Modes, Crystal Structure, Redox Behavior and Stability Научная публикация
| Конференция |
2015 E-MRS Fall Meeting. 12th International Symposium D - Electrochemical/Chemical Reactivity of New Materials 15-18 сент. 2015 , Warsaw |
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| Журнал |
Applied Surface Science
ISSN: 0169-4332 |
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| Вых. Данные | Год: 2016, Том: 388, Номер: Part B, Страницы: 786-793 Страниц : 8 DOI: 10.1016/j.apsusc.2016.04.168 | ||||||
| Ключевые слова | Electrochromic films, Non-stoichiometry, Oxide electrodeposition, Tungstic acid | ||||||
| Авторы |
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| Организации |
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Информация о финансировании (2)
| 1 | Федеральное агентство научных организаций России | V.46.4.4. |
| 2 | Российский фонд фундаментальных исследований | 14-03-01016 |
Реферат:
Bath composition for cathodic electrodeposition of non-stoichiometric hydrated tungstic acid with high electrochromic efficiency is optimized with account for selective electroreduction of certain isopolytungstates. XRD data for thin electrodeposited films and chemically synthesized bulk tungstic acid dihydrate are compared in the context of reversible oxidation and reduction in hydrogen atmosphere, in presence of Pt catalyst. XPS and ТЕМ techniques are attracted to understand the nature of reversible and less reversible transformations of films in the course of their storage and operation.
Библиографическая ссылка:
Pugovkin L.V.
, Sherstyuk O.V.
, Plyasova L.M.
, Molina I.Y.
, Kardash T.Y.
, Stonkus O.A.
, Yatsenko D.A.
, Kaichev V.V.
, Tsirlina G.A.
Electrodeposited Non-Stoichiometric Tungstic Acid for Electrochromic Applications: Film Growth Modes, Crystal Structure, Redox Behavior and Stability
Applied Surface Science. 2016. V.388. NPart B. P.786-793. DOI: 10.1016/j.apsusc.2016.04.168 WOS Scopus РИНЦ CAPlusCA OpenAlex
Electrodeposited Non-Stoichiometric Tungstic Acid for Electrochromic Applications: Film Growth Modes, Crystal Structure, Redox Behavior and Stability
Applied Surface Science. 2016. V.388. NPart B. P.786-793. DOI: 10.1016/j.apsusc.2016.04.168 WOS Scopus РИНЦ CAPlusCA OpenAlex
Даты:
| Поступила в редакцию: | 15 янв. 2016 г. |
| Принята к публикации: | 25 апр. 2016 г. |
| Опубликована online: | 27 апр. 2016 г. |
| Опубликована в печати: | 1 дек. 2016 г. |
Идентификаторы БД:
| Web of science: | WOS:000384573600025 |
| Scopus: | 2-s2.0-84975143285 |
| РИНЦ: | 29466868 |
| Chemical Abstracts: | 2016:730232 |
| Chemical Abstracts (print): | 165:400374 |
| OpenAlex: | W2342556159 |