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Application of RF Discharge in Oxygen to Create Highly Oxidized Metal Layers Full article

Journal Surface Engineering
ISSN: 0267-0844 , E-ISSN: 1743-2944
Output data Year: 2018, Volume: 34, Number: 1, Pages: 1-5 Pages count : 5 DOI: 10.1179/1743294415Y.0000000010
Tags CO oxidation, cupric oxide, Gold oxide, RF plasma, silver oxide, XPS
Authors Stadnichenko A.I. 1,2 , Kibis L.S. 1,2 , Svintsitskiy D.A. 1,2 , Koshcheev S.V. 1 , Boronin A.I. 1,2
Affiliations
1 Boreskov Institute of Catalysis SB RAS, Novosibirsk 630090, Russia
2 Novosibirsk State University, Novosibirsk 630090, Russia

Funding (1)

1 The Ministry of Education and Science of the Russian Federation

Abstract: The radio frequency (RF) discharge in an oxygen atmosphere was used to produce metal oxide films. The high efficiency of the RF discharge technique for metal oxidation at room temperature was demonstrated for gold, silver and copper foils. Oxide films up to 10 nm in thickness were obtained. The produced oxide films were studied by X-ray photoelectron spectroscopy (XPS). The XPS data showed the formation of oxidised species: Cu2+, Ag1+ and Au3+. Analysis of the oxygen species was performed using O1s spectra. For copper and silver foils, the formation of additional oxygen species apart from oxygen in the structure of oxides was shown. The reaction probability toward oxidation of carbon monoxide (CO) was estimated for all oxidised layers. It was established that gold and silver oxide films interacted with CO at room temperature, while cupric oxide showed high activity at temperature >353 K.
Cite: Stadnichenko A.I. , Kibis L.S. , Svintsitskiy D.A. , Koshcheev S.V. , Boronin A.I.
Application of RF Discharge in Oxygen to Create Highly Oxidized Metal Layers
Surface Engineering. 2018. V.34. N1. P.1-5. DOI: 10.1179/1743294415Y.0000000010 WOS Scopus РИНЦ ANCAN OpenAlex
Dates:
Submitted: Aug 13, 2014
Accepted: Jan 9, 2015
Published online: Feb 23, 2016
Published print: Jan 2, 2018
Identifiers:
Web of science: WOS:000428130000001
Scopus: 2-s2.0-84978521866
Elibrary: 31017244
Chemical Abstracts: 2015:144827
Chemical Abstracts (print): 167:559762
OpenAlex: W2044977792
Citing:
DB Citing
Web of science 9
Scopus 9
Elibrary 11
OpenAlex 16
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