Optical Properties of the HfO2 – xNx and TiO2 – xNx Films Prepared by Ion Beam Sputtering | Sciact - CRIS-система Института катализа

Optical Properties of the HfO2 – xNx and TiO2 – xNx Films Prepared by Ion Beam Sputtering Научная публикация

Журнал

Optics and Spectroscopy
ISSN: 0030-400X , E-ISSN: 1562-6911

Вых. Данные

Год: 2009, Том: 106, Номер: 1, Страницы: 72-77 Страниц : 6 DOI: 10.1134/S0030400X09010093

Ключевые слова

Hafnium compoundsIon beams; Nitrides; Nitrogen; Optical properties; Photoelectron spectroscopy; Sputtering; Titanium; Titanium compounds; Titanium dioxide; Titanium nitride

Авторы

Atuchin V.V. ¹ , Kruchinin V.N. ¹ , Kalinkin A.V. ¹ , Aliev V.Sh. ² , Rykhlitskii S.V. ² , Shvets V.A. ² , Spesivtsev E.V. ²

Организации

1	Boreskov Institute of Catalysis, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090 Russia
2	Rzhanov Institute of Semiconductor Physics, Siberian Branch, Russian Academy of Sciences, pr. Akademika Lavrent’eva 13, Novosibirsk, 630090 Russia

Optical characteristics of the HfO2 − x N x and TiO2 − x N x films obtained by reactive ion beam sputtering have been investigated by spectral ellipsometry. The chemical composition of the films was determined using X-ray photoelectron spectroscopy. The nitrogen content in the oxynitride films (determined by the N2/O2 ratio in the gas mixture during synthesis) reached ≈9 at % for TiO2 − x N x and ≈ 6 at % for HfO2 − x N x . It is found that the dispersion relations n(λ) and k(λ) for the TiO2 − x N x films change from those characteristic of titanium dioxide to those typical of titanium nitride with an increase in the nitrogen content from 0 to ≈9 at %. The optical parameters of the HfO2 − x N x films depend weakly on the nitrogen content in the range 0–6 at %.

Atuchin V.V. , Kruchinin V.N. , Kalinkin A.V. , Aliev V.S. , Rykhlitskii S.V. , Shvets V.A. , Spesivtsev E.V.
Optical Properties of the HfO2 – xNx and TiO2 – xNx Films Prepared by Ion Beam Sputtering
Optics and Spectroscopy. 2009. V.106. N1. P.72-77. DOI: 10.1134/S0030400X09010093 WOS Scopus РИНЦ CAPlusCA OpenAlex

Атучин В.В. , Кручинин В.Н. , Калинкин А.В. , Алиев В.Ш. , Рыхлицкий С.В. , Швец В.А. , Спесивцев Е.В.
Оптические свойства пленок HfO(2x)Nx и TiO(2x)Nx, полученных методом ионно-лучевого распыления
Оптика и спектроскопия. 2009. Т.106. №1. С.77-82. РИНЦ

Поступила в редакцию:	17 дек. 2007 г.
Принята к публикации:	29 авг. 2008 г.
Опубликована в печати:	1 янв. 2009 г.
Опубликована online:	4 февр. 2009 г.

Web of science:	WOS:000263097000009
Scopus:	2-s2.0-59749086339
РИНЦ:	13612665
Chemical Abstracts:	2009:142213
Chemical Abstracts (print):	151:346729
OpenAlex:	W2773810700

БД	Цитирований
Web of science	18
Scopus	21
РИНЦ	20
OpenAlex	22