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Effect of Annealing Temperature on the Morphology, Structure, and Optical Properties of Nanostructured SnO(x) Films Научная публикация

Журнал Materials Research Express
, E-ISSN: 2053-1591
Вых. Данные Год: 2020, Том: 7, Номер: 1, Номер статьи : 015027, Страниц : 9 DOI: 10.1088/2053-1591/ab6122
Ключевые слова absorption coefficient; epitaxy; nanostructured film; tin oxide; x-ray diffraction
Авторы Timofeev Vyacheslav A 1 , Mashanov Vladimir I 1 , Nikiforov Alexandr I 1,2 , Azarov Ivan A 1,4 , Loshkarev Ivan D 1 , Korolkov Ilya V 3,4 , Gavrilova Tatyana A 1 , Yesin M Yu 1 , Chetyrin Igor A 5
Организации
1 A.V. Rzhanov Institute of Semiconductor Physics SB RAS, 13 Lavrentyev Avenue, Novosibirsk 630090, Russia
2 National Research Tomsk State University, 36 Lenin Avenue, Tomsk 634050, Russia
3 Nikolaev Institute of Inorganic Chemistry SB RAS, 3 Lavrentyev Avenue, Novosibirsk 630090, Russia
4 Novosibirsk State University, 1 Pirogov str., Novosibirsk 630090, Russia
5 Boreskov Institute of Catalysis SB RAS, 5 Lavrentyev Avenue, Novosibirsk 630090, Russia

Информация о финансировании (3)

1 Российский фонд фундаментальных исследований 18-32-20064 (АААА-А19-119090490028-1)
2 Российский фонд фундаментальных исследований 18-42-540018
3 Российский фонд фундаментальных исследований 18-52-41006 (АААА-А18-118060490033-9)

Реферат: Nanostructured SnO(x) films were obtained by molecular beam epitaxy (MBE). The morphology, structure, and optical properties of obtained films annealed in the temperature range of 200 °C-1000 °C were studied. The reflection high-energy electron diffraction during the film deposition by the MBE method and the x-ray phase analysis showed that the initial films are in the polycrystalline phase. A single orthorhombic SnO2 phase was obtained for the first time after annealing the SnO(x) film in the air at a temperature of about 500 °C. The sharp change in the optical constants near the temperature of 500 °C was established using ellipsometry. The pronounced absorption edge appears in the short-wave region at temperatures above 500 °C and it disappears at lower temperatures. The film thickness changed non-monotonically during the annealing in the air. At first, it grows from 45 nm to 65 nm (active oxidation to 500 °C), and then (above 600 °C) it begins to decrease. The annealing at temperatures of 500 °C-1000 °C leads to the film compaction, since the film thickness decreases to 50 nm, but the refractive index increases by 10%-15%. Optical constants track the progress of film phase and morphological changes. © 2020 The Author(s). Published by IOP Publishing Ltd.
Библиографическая ссылка: Timofeev V.A. , Mashanov V.I. , Nikiforov A.I. , Azarov I.A. , Loshkarev I.D. , Korolkov I.V. , Gavrilova T.A. , Yesin M.Y. , Chetyrin I.A.
Effect of Annealing Temperature on the Morphology, Structure, and Optical Properties of Nanostructured SnO(x) Films
Materials Research Express. 2020. V.7. N1. 015027 :1-9. DOI: 10.1088/2053-1591/ab6122 WOS Scopus РИНЦ CAPlus OpenAlex
Файлы: Полный текст от издателя
Даты:
Поступила в редакцию: 11 окт. 2019 г.
Принята к публикации: 10 дек. 2019 г.
Опубликована online: 12 дек. 2019 г.
Опубликована в печати: 6 янв. 2020 г.
Идентификаторы БД:
Web of science: WOS:000508226200001
Scopus: 2-s2.0-85077949816
РИНЦ: 43231509
Chemical Abstracts: 2020:458362
OpenAlex: W2996104687
Цитирование в БД:
БД Цитирований
Scopus 8
Web of science 6
РИНЦ 4
OpenAlex 10
Альметрики: