Effect of Annealing Temperature on the Morphology, Structure, and Optical Properties of Nanostructured SnO(x) Films | Sciact - CRIS-system of Boreskov Institute of Catalysis

Effect of Annealing Temperature on the Morphology, Structure, and Optical Properties of Nanostructured SnO(x) Films Full article

Journal

Materials Research Express
, E-ISSN: 2053-1591

Output data

Year: 2020, Volume: 7, Number: 1, Article number : 015027, Pages count : 9 DOI: 10.1088/2053-1591/ab6122

Tags

absorption coefficient; epitaxy; nanostructured film; tin oxide; x-ray diffraction

Authors

Timofeev Vyacheslav A ¹ , Mashanov Vladimir I ¹ , Nikiforov Alexandr I ^1,2 , Azarov Ivan A ^1,4 , Loshkarev Ivan D ¹ , Korolkov Ilya V ^3,4 , Gavrilova Tatyana A ¹ , Yesin M Yu ¹ , Chetyrin Igor A ⁵

Affiliations

1	A.V. Rzhanov Institute of Semiconductor Physics SB RAS, 13 Lavrentyev Avenue, Novosibirsk 630090, Russia
2	National Research Tomsk State University, 36 Lenin Avenue, Tomsk 634050, Russia
3	Nikolaev Institute of Inorganic Chemistry SB RAS, 3 Lavrentyev Avenue, Novosibirsk 630090, Russia
4	Novosibirsk State University, 1 Pirogov str., Novosibirsk 630090, Russia
5	Boreskov Institute of Catalysis SB RAS, 5 Lavrentyev Avenue, Novosibirsk 630090, Russia

Funding (3)

1	Russian Foundation for Basic Research	18-32-20064 (АААА-А19-119090490028-1)
2	Russian Foundation for Basic Research	18-42-540018
3	Russian Foundation for Basic Research	18-52-41006 (АААА-А18-118060490033-9)

Nanostructured SnO(x) films were obtained by molecular beam epitaxy (MBE). The morphology, structure, and optical properties of obtained films annealed in the temperature range of 200 °C-1000 °C were studied. The reflection high-energy electron diffraction during the film deposition by the MBE method and the x-ray phase analysis showed that the initial films are in the polycrystalline phase. A single orthorhombic SnO2 phase was obtained for the first time after annealing the SnO(x) film in the air at a temperature of about 500 °C. The sharp change in the optical constants near the temperature of 500 °C was established using ellipsometry. The pronounced absorption edge appears in the short-wave region at temperatures above 500 °C and it disappears at lower temperatures. The film thickness changed non-monotonically during the annealing in the air. At first, it grows from 45 nm to 65 nm (active oxidation to 500 °C), and then (above 600 °C) it begins to decrease. The annealing at temperatures of 500 °C-1000 °C leads to the film compaction, since the film thickness decreases to 50 nm, but the refractive index increases by 10%-15%. Optical constants track the progress of film phase and morphological changes. © 2020 The Author(s). Published by IOP Publishing Ltd.

Timofeev V.A. , Mashanov V.I. , Nikiforov A.I. , Azarov I.A. , Loshkarev I.D. , Korolkov I.V. , Gavrilova T.A. , Yesin M.Y. , Chetyrin I.A.
Effect of Annealing Temperature on the Morphology, Structure, and Optical Properties of Nanostructured SnO(x) Films

Materials Research Express. 2020. V.7. N1. 015027 :1-9. DOI: 10.1088/2053-1591/ab6122 WOS Scopus РИНЦ AN OpenAlex

Full text from publisher

Submitted:	Oct 11, 2019
Accepted:	Dec 10, 2019
Published online:	Dec 12, 2019
Published print:	Jan 6, 2020

Web of science:	WOS:000508226200001
Scopus:	2-s2.0-85077949816
Elibrary:	43231509
Chemical Abstracts:	2020:458362
OpenAlex:	W2996104687

DB	Citing
Scopus	8
Web of science	6
Elibrary	3
OpenAlex	10