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Plasma-Chemical Deposition of Anti-Reflection and Protective Coating for Infrared Optics Научная публикация

Журнал Russian Physics Journal
ISSN: 1064-8887 , E-ISSN: 1573-9228
Вых. Данные Год: 2020, Том: 62, Номер: 11, Страницы: 2112-2120 Страниц : 9 DOI: 10.1007/s11182-020-01954-3
Ключевые слова anti-reflection coatings; protective coatings; infrared optics; plasma-chemical synthesis
Авторы Grenaderov A.S. 1 , Oskomov K.V. 1 , Solovyev A.A. 1,3 , Selivanova A.V. 2 , Konishchev M.E. 3
Организации
1 Institute of High-Current Electronics of the Siberian Branch of the Russian Academy of Sciences, Tomsk, Russia
2 Boreskov Institute of Catalysis of the Siberian Branch of the Russian Academy of Sciences, Novosibirsk, Russia
3 National Research Tomsk Polytechnic University, Tomsk, Russia

Реферат: The films of amorphous hydrogenated carbon doped with Si and O were deposited onto the sample of crystalline silicon by method of plasma-chemical deposition in the mix of polyphenyl methylsiloxane vapors and argon. Physico-mechanical and optical properties of films were examined for their use as anti-reflection and protective coatings in infrared optics devices. Film transparency in the wavelength range of 2.5–8 μm was measured by method of infrared spectroscopy with a Fourier transform. The structure and composition of films were studied by methods of Raman and X-ray photoelectron spectroscopy. Hardness and other mechanical properties of films were determined by nanoindentation. It was shown that the double-sided deposition of a-C:H:SiOx films onto Si plates allows increasing their integrated transmission in the wavelength region of 3– 5 μm from 50 to 87%. The films possess excellent mechanical characteristics, thermal stability in the temperature range from room temperature to 500°С, and resistance to aqueous solutions of salt.
Библиографическая ссылка: Grenaderov A.S. , Oskomov K.V. , Solovyev A.A. , Selivanova A.V. , Konishchev M.E.
Plasma-Chemical Deposition of Anti-Reflection and Protective Coating for Infrared Optics
Russian Physics Journal. 2020. V.62. N11. P.2112-2120. DOI: 10.1007/s11182-020-01954-3 WOS Scopus РИНЦ CAPlus OpenAlex
Оригинальная: Гренадёров А.С. , Оскомов К.В. , Соловьёв А.А. , Селиванова А.В. , Конищев М.Е.
Плазмохимическое осаждение антиотражающего и защитного покрытия для ИК-оптики
Известия высших учебных заведений. Физика. 2019. Т.62. №11. С.143-150. DOI: 10.17223/00213411/62/11/143RSCI РИНЦ OpenAlex
Даты:
Поступила в редакцию: 13 сент. 2019 г.
Опубликована в печати: 1 мар. 2020 г.
Опубликована online: 13 мар. 2020 г.
Идентификаторы БД:
Web of science: WOS:000519832300015
Scopus: 2-s2.0-85082457122
РИНЦ: 43265352
Chemical Abstracts: 2020:499465
OpenAlex: W3011351981
Цитирование в БД:
БД Цитирований
Web of science 3
Scopus 4
РИНЦ 4
OpenAlex 4
Альметрики: