Abstract: The films of amorphous hydrogenated carbon doped with Si and O were deposited onto the sample of crystalline silicon by method of plasma-chemical deposition in the mix of polyphenyl methylsiloxane vapors and argon. Physico-mechanical and optical properties of films were examined for their use as anti-reflection and protective coatings in infrared optics devices. Film transparency in the wavelength range of 2.5–8 μm was measured by method of infrared spectroscopy with a Fourier transform. The structure and composition of films were studied by methods of Raman and X-ray photoelectron spectroscopy. Hardness and other mechanical properties of films were determined by nanoindentation. It was shown that the double-sided deposition of a-C:H:SiOx films onto Si plates allows increasing their integrated transmission in the wavelength region of 3– 5 μm from 50 to 87%. The films possess excellent mechanical characteristics, thermal stability in the temperature range from room temperature to 500°С, and resistance to aqueous solutions of salt.

Cite: Grenaderov A.S. , Oskomov K.V. , Solovyev A.A. , Selivanova A.V. , Konishchev M.E.
Plasma-Chemical Deposition of Anti-Reflection and Protective Coating for Infrared Optics
Russian Physics Journal. 2020. V.62. N11. P.2112-2120. DOI: 10.1007/s11182-020-01954-3 WOS Scopus РИНЦ AN OpenAlex

Original: Гренадёров А.С. , Оскомов К.В. , Соловьёв А.А. , Селиванова А.В. , Конищев М.Е.
Плазмохимическое осаждение антиотражающего и защитного покрытия для ИК-оптики
Известия высших учебных заведений. Физика. 2019. Т.62. №11. С.143-150. DOI: 10.17223/00213411/62/11/143RSCI РИНЦ OpenAlex

Dates:

Submitted:	Sep 13, 2019
Published print:	Mar 1, 2020
Published online:	Mar 13, 2020

Identifiers:

Web of science:	WOS:000519832300015
Scopus:	2-s2.0-85082457122
Elibrary:	43265352
Chemical Abstracts:	2020:499465
OpenAlex:	W3011351981

Citing:

DB	Citing
Web of science	2
Scopus	3
Elibrary	4
OpenAlex	3

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