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Defect Structure of Nanocrystalline NiO Oxide Stabilized by SiO2 Научная публикация

Журнал Inorganics
, E-ISSN: 2304-6740
Вых. Данные Год: 2023, Том: 11, Номер: 3, Номер статьи : 97, Страниц : 14 DOI: 10.3390/inorganics11030097
Ключевые слова defect structure; modeling; nanoparticles; nickel oxide
Авторы Mikhnenko Maxim D. 1 , Cherepanova Svetlana V. 1 , Gerasimov Evgeny Yu 1 , Pochtar Alena A. 1 , Alekseeva (Bykova) Maria V. 1 , Kukushkin Roman G. 1 , Yakovlev Vadim A. 1 , Bulavchenko Olga A. 1
Организации
1 Boreskov Institute of Catalysis, Siberian Branch of the Russian Academy of Science, Lavrentiev Ave. 5, Novosibirsk 630090, Russia

Информация о финансировании (3)

1 Министерство науки и высшего образования Российской Федерации (с 15 мая 2018) 0239-2021-0002
2 Министерство науки и высшего образования Российской Федерации (с 15 мая 2018) 0239-2021-0005
3 Министерство науки и высшего образования Российской Федерации (с 15 мая 2018) 0239-2021-0003

Реферат: In this paper, structural features of the NiO-SiO2 nanocrystalline catalyst synthesized by the sol-gel method were studied by X-ray diffraction (XRD), high-resolution transmission electron microscopy (TEM), and differential dissolution (DD). The XRD pattern of NiO-SiO2 significantly differs from the “ideal” NiO pattern: the peaks of the NiO-like phase are asymmetric, especially the 111 diffraction peak. The NiO-SiO2 nanocrystalline catalyst was investigated by means of XRD simulations based on two approaches: conventional Rietveld analysis and statistical models of 1D disordered crystals. Through a direct simulation of XRD profiles, structural information is extracted from both the Bragg and diffuse scattering. XRD simulations showed that the asymmetry of all the diffraction peaks is due to the presence of two NiO-like oxides with different lattice constants and different average sizes: ~90 wt% of mixed Ni-Si oxide (Ni:Si = 0.14:0.86) with average crystallite sizes (D ~ 27.5 Å) and ~10 wt% of pure NiO (D ~ 50 Å). The high asymmetry of the 111 diffraction peak is due to the appearance of diffuse scattering caused by the inclusion of tetrahedral SiO2 layers between octahedral NiO layers. Such methods as TEM and DD were applied as independent criteria to prove the structural model, and the results obtained confirm the formation of mixed Ni-Si oxide.
Библиографическая ссылка: Mikhnenko M.D. , Cherepanova S.V. , Gerasimov E.Y. , Pochtar A.A. , Alekseeva (Bykova) M.V. , Kukushkin R.G. , Yakovlev V.A. , Bulavchenko O.A.
Defect Structure of Nanocrystalline NiO Oxide Stabilized by SiO2
Inorganics. 2023. V.11. N3. 97 :1-14. DOI: 10.3390/inorganics11030097 WOS Scopus РИНЦ CAPlus OpenAlex
Даты:
Поступила в редакцию: 31 янв. 2023 г.
Принята к публикации: 23 февр. 2023 г.
Опубликована online: 27 февр. 2023 г.
Опубликована в печати: 1 мар. 2023 г.
Идентификаторы БД:
Web of science: WOS:000955624800001
Scopus: 2-s2.0-85151144467
РИНЦ: 54175609
Chemical Abstracts: 2023:701150
OpenAlex: W4322619572
Цитирование в БД:
БД Цитирований
Web of science 5
Scopus 5
OpenAlex 5
РИНЦ 6
Альметрики: