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Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition Full article

Journal Journal of Structural Chemistry
ISSN: 0022-4766 , E-ISSN: 1573-8779
Output data Year: 2003, Volume: 44, Number: 1, Pages: 169-173 Pages count : 5 DOI: 10.1023/A:1024953518950
Tags Film microstructure, Films, Silicon carbonitride, X-ray phase analysis
Authors Smirnova T.P. 1 , Badalyan A.M. 1 , Borisov V.O. 1 , Yakovkina L.V. 1 , Kaichev V.V. 2 , Shmakov A.N. 2 , Nartova A.V. 2 , Rakhlin V.I. 3 , Fomina A.N. 3
Affiliations
1 Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk
2 Boreskov Institute of Catalysis, Siberian Branch, Russian Academy of Sciences, Novosibirsk
3 Favorskii Institute of Chemistry, Siberian Branch, Russian Academy of Sciences, Irkutsk

Abstract: Silicon carbonitride films were synthesized by plasma enhanced chemical vapor deposition using silyl derivatives of asymmetric dimethylhydrazine, (CH3)2HSiNHN(CH3)2 and (CH3)2Si[NHN(CH3)2]2, as molecular precursors. The film material consists of an amorphous matrix with nanocrystalline inclusions. Indexing of synchrotron radiation X‐ray diffraction patterns suggests that the structure of the nanocrystals is tetragonal with lattice parameters a = 9.6Å and c = 6.4Å. X‐ray photoelectron spectra indicate that Si—N and C—N sp 3 hybrid bonds are predominant. The absence of G‐ or D‐modes in Raman spectra, which are otherwise typical of structures possessing sp 2 bonding, provides further support for the tetragonal structure of the nanocrystals.
Cite: Smirnova T.P. , Badalyan A.M. , Borisov V.O. , Yakovkina L.V. , Kaichev V.V. , Shmakov A.N. , Nartova A.V. , Rakhlin V.I. , Fomina A.N.
Microstructure and Chemical Bonding in Silicon Carbonitride Films Synthesized by Plasma Enhanced Chemical Vapor Deposition
Journal of Structural Chemistry. 2003. V.44. N1. P.169-173. DOI: 10.1023/A:1024953518950 WOS Scopus РИНЦ ANCAN OpenAlex
Original: Смирнова Т.П. , Бадалян А.М. , Борисов В.О. , Яковкина Л.В. , Каичев В.В. , Шмаков А.Н. , Нартова А.В. , Рахлин В.И. , Фомина А.Н.
Микроструктура и химическое связывание в пленках карбонитрида кремния, синтезированных методом плазмохимического осаждения из газовой фазы
Журнал структурной химии. 2003. Т.44. №1. С.195-199. РИНЦ
Dates:
Submitted: Dec 21, 2001
Accepted: Sep 20, 2002
Published print: Jan 1, 2003
Identifiers:
Web of science: WOS:000184894700016
Scopus: 2-s2.0-0042711034
Elibrary: 13433860
Chemical Abstracts: 2003:575830
Chemical Abstracts (print): 139:384750
OpenAlex: W203044934
Citing:
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Web of science 10
Scopus 10
Elibrary 10
OpenAlex 10
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