A Study of the Structure of (HfO2 ) x (Al2 O3)1−x /Si Films by X-Ray Photoelectron Spectroscopy | Sciact - CRIS-system of Boreskov Institute of Catalysis

A Study of the Structure of (HfO2 ) x (Al2 O3)1−x /Si Films by X-Ray Photoelectron Spectroscopy Full article

Journal

Journal of Structural Chemistry
ISSN: 0022-4766 , E-ISSN: 1573-8779

Output data

Year: 2011, Volume: 52, Number: 3, Pages: 480-487 Pages count : 8 DOI: 10.1134/S002247661103005X

Funding (1)

Siberian Branch of the Russian Academy of Sciences

By X-ray photoelectron spectroscopy (XPS), using the technique of layer-by-layer analysis, the films of (HfO2) x (Al2O3)1−x solid solutions synthesized by chemical vapor deposition are studied. The possibility to determine the structure of solid binary solutions based on the analysis of the XPS spectra is demonstrated.

Kaichev V.V. , Dubinin Y.V. , Smirnova T.P. , Lebedev M.S.
A Study of the Structure of (HfO2 ) x (Al2 O3)1−x /Si Films by X-Ray Photoelectron Spectroscopy
Journal of Structural Chemistry. 2011. V.52. N3. P.480-487. DOI: 10.1134/S002247661103005X WOS Scopus РИНЦ ANCAN OpenAlex

Каичев В.В. , Дубинин Ю.В. , Смирнова Т.П. , Лебедев М.С.
Изучение структуры пленок (HfO2)x(Al2O3)1–x/Si методом рентгеновской фотоэлектронной спектроскопии
Журнал структурной химии. 2011. Т.52. №3. С.495-502. RSCI РИНЦ

Submitted:	Mar 5, 2010
Published print:	Jun 1, 2011
Published online:	Jul 29, 2011

Web of science:	WOS:000294860200005
Scopus:	2-s2.0-80054764488
Elibrary:	18009920
Chemical Abstracts:	2011:947680
Chemical Abstracts (print):	155:601881
OpenAlex:	W2040937254

DB	Citing
Web of science	11
Scopus	11
Elibrary	12
OpenAlex	11