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The Model Thin Film Alumina Catalyst Support Suitable for Catalysis-oriented Surface Science Studies Научная публикация

Журнал Applied Surface Science
ISSN: 0169-4332
Вых. Данные Год: 2015, Том: 349, Страницы: 310-318 Страниц : 9 DOI: 10.1016/j.apsusc.2015.04.177
Ключевые слова Alumina film, Model catalyst support, STMXPS
Авторы Nartova Anna V. 1,2 , Bukhtiyarov Andrey V. 1 , Kvon Ren I. 1 , Bukhtiyarov Valerii I. 1,2
Организации
1 Boreskov Institute of Catalysis SB RAS, Lavrentieva Ave., 5, Novosibirsk, 630090, Russia
2 Novosibirsk State University, Pirogova St., 2, Novosibirsk, 630090, Russia

Информация о финансировании (1)

1 Российский научный фонд 14-23-00146

Реферат: The preparation of thin continuous alumina film at the surface of metal substrate in UHV (ultra high vacuum) conditions is described. The peculiarities of the obtained films studied by XPS (X ray photoelectron spectroscopy) and STM (scanning tunneling microscopy) are discussed. The long-term durability of the oxide film was tested and proved both under ambient conditions and in acidic aqueous solutions. The stability of the planar alumina samples toward oxidation by oxygen was checked in the wide ranges of gas pressure and sample temperature. The suggested procedure ensures the controlled and reproducible preparation of thin alumina films – model support appropriate for wet chemistry catalyst preparation, suitable for STM and for other Surface Science techniques studies of alumina supported metal catalysts.
Библиографическая ссылка: Nartova A.V. , Bukhtiyarov A.V. , Kvon R.I. , Bukhtiyarov V.I.
The Model Thin Film Alumina Catalyst Support Suitable for Catalysis-oriented Surface Science Studies
Applied Surface Science. 2015. V.349. P.310-318. DOI: 10.1016/j.apsusc.2015.04.177 WOS Scopus РИНЦ CAPlusCA OpenAlex
Даты:
Поступила в редакцию: 23 янв. 2015 г.
Принята к публикации: 26 апр. 2015 г.
Опубликована online: 4 мая 2015 г.
Опубликована в печати: 1 сент. 2015 г.
Идентификаторы БД:
Web of science: WOS:000357129100044
Scopus: 2-s2.0-84937709972
РИНЦ: 23992101
Chemical Abstracts: 2015:793965
Chemical Abstracts (print): 163:43740
OpenAlex: W299948820
Цитирование в БД:
БД Цитирований
Web of science 17
Scopus 20
РИНЦ 22
OpenAlex 20
Альметрики: