Abstract: The preparation of thin continuous alumina film at the surface of metal substrate in UHV (ultra high vacuum) conditions is described. The peculiarities of the obtained films studied by XPS (X ray photoelectron spectroscopy) and STM (scanning tunneling microscopy) are discussed. The long-term durability of the oxide film was tested and proved both under ambient conditions and in acidic aqueous solutions. The stability of the planar alumina samples toward oxidation by oxygen was checked in the wide ranges of gas pressure and sample temperature. The suggested procedure ensures the controlled and reproducible preparation of thin alumina films – model support appropriate for wet chemistry catalyst preparation, suitable for STM and for other Surface Science techniques studies of alumina supported metal catalysts.

Cite: Nartova A.V. , Bukhtiyarov A.V. , Kvon R.I. , Bukhtiyarov V.I.
The Model Thin Film Alumina Catalyst Support Suitable for Catalysis-oriented Surface Science Studies
Applied Surface Science. 2015. V.349. P.310-318. DOI: 10.1016/j.apsusc.2015.04.177 WOS Scopus РИНЦ ANCAN OpenAlex

Dates:

Submitted:	Jan 23, 2015
Accepted:	Apr 26, 2015
Published online:	May 4, 2015
Published print:	Sep 1, 2015

Identifiers:

Web of science:	WOS:000357129100044
Scopus:	2-s2.0-84937709972
Elibrary:	23992101
Chemical Abstracts:	2015:793965
Chemical Abstracts (print):	163:43740
OpenAlex:	W299948820

Citing:

DB	Citing
Web of science	17
Scopus	20
Elibrary	22
OpenAlex	20

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