Photoluminescence Study of the Electronic Structure of HfO2 Films Full article
Journal |
Journal of Structural Chemistry
ISSN: 0022-4766 , E-ISSN: 1573-8779 |
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Output data | Year: 2008, Volume: 49, Number: 1, Pages: 21-30 Pages count : 10 DOI: 10.1007/s10947-008-0004-9 | ||||
Tags | Hafnium dioxide films, Hydroxyl radical, Photoluminescence, Water | ||||
Authors |
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Affiliations |
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Funding (2)
1 | Russian Foundation for Basic Research | 05-03-32393 |
2 | Council for Grants of the President of the Russian Federation | НШ-4419.2006.3 |
Abstract:
A method was developed for investigating hafnium dioxide films; this procedure uses a hydrogen-deuterium lamp as a source of photoluminescence (PL) excitation. Photoluminescence in HfO2 films was investigated. An analysis of the PL spectra of the films showed that they coincided with the spectra described in the literature and recorded using more powerful sources (synchrotron radiation or ArF laser). A comparison of our results with the literature data confirmed that the PL spectra of the films weakly depended on the type of the substrate used for the synthesis. The PL band intensity depends on the synthetic conditions and the annealing temperature. We analyzed the PL and excitation spectra and revealed an emission band at an energy E ∼ 4 eV with a narrow excitation maximum at E max ≅ 4.25 eV, which was assigned to the vibronic resonance transition A 2Σ+ ↔ X 2Πi in the OH•* excited radical. Water was detected in the PL spectra of the HfO2 films; it is trapped as an impurity after thermal decomposition of Hf(dpm)4 in the course of film growth. The detection of water in the PL spectra of these films provides new insight into the problem of the effect of this impurity on the leakage currents and the importance of control over its content in the films.
Cite:
Rastorguev A.A.
, Belyi V.I.
, Smirnova T.P.
, Yakovkina L.V.
Photoluminescence Study of the Electronic Structure of HfO2 Films
Journal of Structural Chemistry. 2008. V.49. N1. P.21-30. DOI: 10.1007/s10947-008-0004-9 WOS Scopus РИНЦ
Photoluminescence Study of the Electronic Structure of HfO2 Films
Journal of Structural Chemistry. 2008. V.49. N1. P.21-30. DOI: 10.1007/s10947-008-0004-9 WOS Scopus РИНЦ
ArticleLinkType.TRANSLATED_TO_ORIGINAL:
Расторгуев А.А.
, Белый В.И.
, Смирнова Т.П.
, Яковкина Л.В.
Исследование электронной структуры пленок HfO2 методом фотолюминесценции
Журнал структурной химии. 2008. Т.49. №1. С.27-36. РИНЦ
Исследование электронной структуры пленок HfO2 методом фотолюминесценции
Журнал структурной химии. 2008. Т.49. №1. С.27-36. РИНЦ
Dates:
Submitted: | Apr 28, 2007 |
Published print: | Jan 1, 2008 |
Identifiers:
Web of science | WOS:000255585700004 |
Scopus | 2-s2.0-43049104532 |
Elibrary | 13565411 |
Chemical Abstracts | 2008:536234 |
Chemical Abstracts (print) | 149:186065 |
OpenAlex | W2024569428 |