Chloropolymer Precursor Utilization for the Nanostructured Co-Containing Carbon Layers Formation on Silicon Substrate Научная публикация
| Конференция |
Юбилейная научная конференция "XXI век: Химия в жизнь" 24-26 апр. 2019 , Омск |
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| Журнал |
AIP Conference Proceedings
ISSN: 0094-243X , E-ISSN: 1551-7616 |
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| Вых. Данные | Год: 2019, Том: 2143, Номер статьи : 020016, Страниц : 5 DOI: 10.1063/1.5122915 | ||||||
| Авторы |
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| Организации |
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Информация о финансировании (1)
| 1 | Федеральное агентство научных организаций России | 0363-2016-0001 (II.9.2.1)(АААА-А17-117041210227-8) |
Реферат:
The possibility of nanostructured Co-containing carbon layers formation by means of the approach based on polyvinyl chloride alkaline dehydrochlorination in dimethyl sulfoxide in the presence of Co-nitrate is shown. From the mentioned reaction mixture, the layers of the carbon polymer precursor – polyvinylene formed during dehydrochlorination were deposited on the silicon wafer by spin coating. The obtained layers heat treatment up to 400 °C results in the formation of Co-carbon nanostructured continuous layers which structure is studied by the atomic force microscopy.
Библиографическая ссылка:
Krivozubov O.V.
, Kryazhev Y.G.
, Anikeeva I.V.
, Davletkildeev N.A.
, Sokolov D.V.
, Semenova O.N.
Chloropolymer Precursor Utilization for the Nanostructured Co-Containing Carbon Layers Formation on Silicon Substrate
AIP Conference Proceedings. 2019. V.2143. 020016 :1-5. DOI: 10.1063/1.5122915 WOS Scopus РИНЦ CAPlus OpenAlex
Chloropolymer Precursor Utilization for the Nanostructured Co-Containing Carbon Layers Formation on Silicon Substrate
AIP Conference Proceedings. 2019. V.2143. 020016 :1-5. DOI: 10.1063/1.5122915 WOS Scopus РИНЦ CAPlus OpenAlex
Даты:
| Опубликована online: | 16 авг. 2019 г. |
Идентификаторы БД:
| Web of science: | WOS:000505769900016 |
| Scopus: | 2-s2.0-85071271183 |
| РИНЦ: | 41659349 |
| Chemical Abstracts: | 2019:2069939 |
| OpenAlex: | W2968191115 |