Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation | Sciact - CRIS-система Института катализа

Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation Научная публикация

Журнал

High Energy Chemistry
ISSN: 0018-1439

Вых. Данные

Год: 2019, Том: 53, Номер: 2, Страницы: 136-142 Страниц : 7 DOI: 10.1134/s0018143919020048

Ключевые слова

acrylamide monomers; acrylate monomers; polymerization; X-ray lithography; X-ray resist

Авторы

Derevyanko D.I. ¹ , Orlova N.A. ¹ , Shelkovnikov V.V. ^1,2 , Shundrina I.K. ¹ , Goldenberg B.G. ³ , Korolkov V.P. ⁴

Организации

1	Novosibirsk Institute of Organic Chemistry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090 Russia
2	Novosibirsk State Technical University, Novosibirsk, 630073 Russia
3	Budker Institute of Nuclear Physics, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090 Russia
4	Institute of Automation and Electrometry, Siberian Branch, Russian Academy of Sciences, Novosibirsk, 630090 Russia

Photopolymer materials based on new polyacryl monomers of acrylate and mixed acrylate–acrylamide types have been obtained. Crosslinked films based on the synthesized monomers have been prepared by photopolymerization, and the thermomechanical properties of the crosslinked films have been studied. The storage modulus of the photopolymer films were determined at room temperature (1.3 and 1.5 GPa) and the glass transition temperature (82–93°С). High-aspect-ratio microstructures have been written using synchrotron radiation (SR) at the VEPP-3 storage ring (electron energy, 2 GeV) of a LIGA station at the Budker Institute of Nuclear Physics, SB RAS. It has been revealed that a synchrotron radiation dose of 1–15 J/cm3 results in polymerization of the monomers. The dependence of the thickness of a given microstructure on the absorbed SR dose has been found, and the corresponding characteristic curve has been constructed. Microstructures with an aspect ratio of 1 : 25 have been obtained.

Derevyanko D.I. , Orlova N.A. , Shelkovnikov V.V. , Shundrina I.K. , Goldenberg B.G. , Korolkov V.P.
Fabrication of High-Aspect-Ratio Microstructures on Tetraacrylate/Acrylamide Monomers Using Synchrotron Radiation
High Energy Chemistry. 2019. V.53. N2. P.136-142. DOI: 10.1134/s0018143919020048 WOS Scopus РИНЦ CAPlusCA OpenAlex

Деревянко Д.И. , Орлова Н.А. , Шелковников В.В. , Шундрина И.К. , Гольденберг Б.Г. , Корольков В.П.
Формирование высокоаспектных микроструктур на тетраакрилат/акриламидных мономерах под действием синхротронного излучения
Химия высоких энергий. 2019. Т.53. №2. С.127–134. DOI: 10.1134/S0023119319020049 РИНЦ OpenAlex

Поступила в редакцию:	9 апр. 2018 г.
Принята к публикации:	2 нояб. 2018 г.
Опубликована в печати:	1 мар. 2019 г.
Опубликована online:	24 мая 2019 г.

Web of science:	WOS:000469020800007
Scopus:	2-s2.0-85066323752
РИНЦ:	41645139
Chemical Abstracts:	2019:1042188
Chemical Abstracts (print):	174:549673
OpenAlex:	W2946741416

БД	Цитирований
Web of science	1
Scopus	2
OpenAlex	2